Extendibility of EUV resists in the exposure wavelength from 13.5 down to 3.1 nm for next-generation lithography

Tomoko G. Oyama, Tomohiro Takahashi, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

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