Extendibility of proximity x-ray lithography to 25 nm and below

Eijiro Toyota; Masakazu Washio

doi:10.1116/1.1524972

Extendibility of proximity x-ray lithography to 25 nm and below

Eijiro Toyota^*, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

A procedure to extend the limit of proximity x-ray lithography (PXL) by changing the exposure methods is proposed. In particular, it is shown that PXL can be used at 25 nm and most probably 18 nm design rule by changing the exposure methods corresponding to the gap limit by steppers. The same light source and facility layout can be used throughout the full generations of PXL.

Original language	English
Pages (from-to)	2979-2983
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1524972
Publication status	Published - 2002 Nov

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1524972

Cite this

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title = "Extendibility of proximity x-ray lithography to 25 nm and below",

abstract = "A procedure to extend the limit of proximity x-ray lithography (PXL) by changing the exposure methods is proposed. In particular, it is shown that PXL can be used at 25 nm and most probably 18 nm design rule by changing the exposure methods corresponding to the gap limit by steppers. The same light source and facility layout can be used throughout the full generations of PXL.",

author = "Eijiro Toyota and Masakazu Washio",

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AU - Washio, Masakazu

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AB - A procedure to extend the limit of proximity x-ray lithography (PXL) by changing the exposure methods is proposed. In particular, it is shown that PXL can be used at 25 nm and most probably 18 nm design rule by changing the exposure methods corresponding to the gap limit by steppers. The same light source and facility layout can be used throughout the full generations of PXL.

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M3 - Article

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ER -

Extendibility of proximity x-ray lithography to 25 nm and below

Abstract

ASJC Scopus subject areas

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