Abstract
We have performed nitrogen atomic-layer doping into GaAs, AlGaAs, and AlGaAs/GaAs single quantum wells using atomic nitrogen cracked by a hot tungsten filament. While the atomic-layer-doped GaAs layers show a series of sharp and strong photoluminescence lines relating to excitons bound to nitrogen atoms at 8K, atomic-layer-doped AlGaAs layers show several broad nitrogen-related lines. For the atomic-layer-doped single quantum well at the center of the GaAs layer, the quantum well luminescence itself disappears and a dominant and sharp luminescence is observed at a longer wavelength. It is found that the As pressure during the atomic-layer doping greatly affects the luminescence characteristics.
Original language | English |
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Pages (from-to) | 1527-1530 |
Number of pages | 4 |
Journal | Journal of Electronic Materials |
Volume | 25 |
Issue number | 9 |
DOIs | |
Publication status | Published - 1996 Sept |
Externally published | Yes |
Keywords
- AlGaAs/GaAs
- Atomic-layer doping
- GaAs
- Isoelectronic traps
- Photoluminescence (PL)
- Secondary ion mass spectrometry (SIMS)
- δ-doping
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry