Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

Zhigang Wu, Weigang Zhang, Zhi Wang, Guiyun Kai, Shuzhong Yuan, Xiaoyi Dong, K. Utaka, Y. Wada

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

Original languageEnglish
Pages (from-to)1347-1350
Number of pages4
JournalPan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
Volume27
Issue number8
Publication statusPublished - 2006 Aug 1

Keywords

  • Bragg grating
  • Integrated optics
  • Rib waveguide
  • Silicon-on-insulator

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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