Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

Zhigang Wu, Weigang Zhang, Zhi Wang, Guiyun Kai, Shuzhong Yuan, Xiaoyi Dong, Katsuyuki Utaka, Y. Wada

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

    Original languageEnglish
    Pages (from-to)1347-1350
    Number of pages4
    JournalPan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
    Volume27
    Issue number8
    Publication statusPublished - 2006 Aug

    Fingerprint

    Bragg gratings
    Electron beam lithography
    Silicon
    Waveguides
    lithography
    insulators
    electron beams
    waveguides
    Fabrication
    fabrication
    evaluation
    silicon
    gratings
    Diffraction gratings
    coupling coefficients
    Photonics
    Etching
    etching
    photonics

    Keywords

    • Bragg grating
    • Integrated optics
    • Rib waveguide
    • Silicon-on-insulator

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

    Cite this

    Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography. / Wu, Zhigang; Zhang, Weigang; Wang, Zhi; Kai, Guiyun; Yuan, Shuzhong; Dong, Xiaoyi; Utaka, Katsuyuki; Wada, Y.

    In: Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, Vol. 27, No. 8, 08.2006, p. 1347-1350.

    Research output: Contribution to journalArticle

    Wu, Zhigang ; Zhang, Weigang ; Wang, Zhi ; Kai, Guiyun ; Yuan, Shuzhong ; Dong, Xiaoyi ; Utaka, Katsuyuki ; Wada, Y. / Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography. In: Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors. 2006 ; Vol. 27, No. 8. pp. 1347-1350.
    @article{9b9aa28f6a5b42dfb7a2221366dfe2da,
    title = "Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography",
    abstract = "The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.",
    keywords = "Bragg grating, Integrated optics, Rib waveguide, Silicon-on-insulator",
    author = "Zhigang Wu and Weigang Zhang and Zhi Wang and Guiyun Kai and Shuzhong Yuan and Xiaoyi Dong and Katsuyuki Utaka and Y. Wada",
    year = "2006",
    month = "8",
    language = "English",
    volume = "27",
    pages = "1347--1350",
    journal = "Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors",
    issn = "0253-4177",
    publisher = "Kexue Chubaneshe/Science Press",
    number = "8",

    }

    TY - JOUR

    T1 - Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

    AU - Wu, Zhigang

    AU - Zhang, Weigang

    AU - Wang, Zhi

    AU - Kai, Guiyun

    AU - Yuan, Shuzhong

    AU - Dong, Xiaoyi

    AU - Utaka, Katsuyuki

    AU - Wada, Y.

    PY - 2006/8

    Y1 - 2006/8

    N2 - The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

    AB - The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

    KW - Bragg grating

    KW - Integrated optics

    KW - Rib waveguide

    KW - Silicon-on-insulator

    UR - http://www.scopus.com/inward/record.url?scp=33748996780&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=33748996780&partnerID=8YFLogxK

    M3 - Article

    AN - SCOPUS:33748996780

    VL - 27

    SP - 1347

    EP - 1350

    JO - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

    JF - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

    SN - 0253-4177

    IS - 8

    ER -