Fabrication of 3-D micromesh ni structures using electroplating

Hironobu Sato, Toshiharu Otsuka, Shuichi Shoji

Research output: Contribution to conferencePaper

Abstract

This paper presents the fabrication method of 3-D Ni micromesh structures. Inverse-micromesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni micromeshes of about 3μm in diameter were realized by this method. This structure is useful for increasing the surface area of micro metal electrodes.

Original languageEnglish
Pages26-30
Number of pages5
Publication statusPublished - 2004 Dec 1
EventMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium - Honolulu, HI, United States
Duration: 2004 Oct 32004 Oct 8

Conference

ConferenceMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium
CountryUnited States
CityHonolulu, HI
Period04/10/304/10/8

ASJC Scopus subject areas

  • Engineering(all)

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    Sato, H., Otsuka, T., & Shoji, S. (2004). Fabrication of 3-D micromesh ni structures using electroplating. 26-30. Paper presented at Microfabricated Systems and MEMS VII - Proceedings of the International Symposium, Honolulu, HI, United States.