Fabrication of 3D a-Si/SiO 2 photonic crystals on 2D sub-micron-patterned InP substrates

Tetsuro Segawa, Katsuyuki Utaka, Mitsuru Naganuma, Hisashi Sato, Shojiro Kawakami, Masayuki Izutsu, Masashi Nakao

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    We have fabricated three-dimensional (3D) periodic structures consisting of stacked a-Si/SiO 2 layers directly on two-dimensional (2D) sub-micron-patterned (100)-InP substrates by using autocloning technology. The initial 2D pattern has been reflected in the 3D periodic structures, whose height has been amplified. We have measured the transmission and reflection spectra of the 3D periodic structures, and have observed the photonic band gaps in the wavelength region of around 1400 to 2200 nm. We have also observed strong polarization dependency for the samples with the triangular lattice and week dependency for those of the square case.

    Original languageEnglish
    Title of host publicationConference Proceedings - International Conference on Indium Phosphide and Related Materials
    Pages561-564
    Number of pages4
    Publication statusPublished - 2002
    Event14th Indium Phosphide and Related Materials Conference - Stockholm, Sweden
    Duration: 2002 May 122002 May 16

    Other

    Other14th Indium Phosphide and Related Materials Conference
    CountrySweden
    CityStockholm
    Period02/5/1202/5/16

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    ASJC Scopus subject areas

    • Materials Science(all)
    • Physics and Astronomy(all)

    Cite this

    Segawa, T., Utaka, K., Naganuma, M., Sato, H., Kawakami, S., Izutsu, M., & Nakao, M. (2002). Fabrication of 3D a-Si/SiO 2 photonic crystals on 2D sub-micron-patterned InP substrates In Conference Proceedings - International Conference on Indium Phosphide and Related Materials (pp. 561-564)