Fabrication of 3D a-Si/SiO2 photonic crystals on 2D sub-micron-patterned InP substrates

Tetsuro Segawa*, Katsuyuki Utaka, Mitsuru Naganuma, Hisashi Sato, Shojiro Kawakami, Masayuki Izutsu, Masashi Nakao

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


We have fabricated three-dimensional (3D) periodic structures consisting of stacked a-Si/SiO2 layers directly on two-dimensional (2D) sub-micron-patterned (100)-InP substrates by using autocloning technology. The initial 2D pattern has been reflected in the 3D periodic structures, whose height has been amplified. We have measured the transmission and reflection spectra of the 3D periodic structures, and have observed the photonic band gaps in the wavelength region of around 1400 to 2200 nm. We have also observed strong polarization dependency for the samples with the triangular lattice and week dependency for those of the square case.

Original languageEnglish
Pages (from-to)561-564
Number of pages4
JournalConference Proceedings - International Conference on Indium Phosphide and Related Materials
Publication statusPublished - 2002 Jan 1
Event14th Indium Phosphide and Related Materials Conference - Stockholm, Sweden
Duration: 2002 May 122002 May 16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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