Fabrication of a Cu nanodot array based on electroless plating employing a diblock copolymer nanotemplate

Shuichi Asakura, Atsushi Hozumi, Akio Fuwa

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    An array of copper (Cu) nanodots was fabricated onto a Si substrate covered with native oxide (Si O2 Si) using a diblock copolymer as a resist film. First, polystyrene/polymethylmethacrylate (PS/PMMA) diblock copolymer was spin-coated on a Si O2 Si substrate and then annealed for 24 h in a vacuum oven maintained at 170 °C to achieve good phase separation. To prepare a nanotemplate, this phase-separated diblock copolymer film was photodecomposed selectively using 172 nm vacuum ultraviolet (VUV) light. Due to the difference in photoetching rate between PS and PMMA domains, the latter regions were preferentially decomposed. By controlling the VUV irradiation conditions, that is, exposure time and atmospheric pressure, we were able to prepare a diblock copolymer template comprised of a nanoporous PS matrix on the Si O2 Si surface. Next, the nanopore regions were site-selectively modified through a vapor phase chemisorption of an amino-terminated organosilane. Palladium (Pd[II]) particles were then immobilized onto the amino-terminated nanopore regions through donor and accepter reactions and, subsequently, Cu was selectively electroless-plated onto these Pd-activated regions. As evidenced by atomic force microscopy, due to the elimination of the residual PS nanotemplate by VUV irradiation, we fabricated an array of Cu nanodots 3.0 to ∼4.3 nm in height and 10 to ∼25 nm in diameter on the entire 10×10 mm2 area of the Si O2 Si substrate.

    Original languageEnglish
    Pages (from-to)1137-1140
    Number of pages4
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume23
    Issue number4
    DOIs
    Publication statusPublished - 2005 Jul

    Fingerprint

    Electroless plating
    plating
    Block copolymers
    copolymers
    Vacuum
    Fabrication
    vacuum
    fabrication
    Nanopores
    Polymethyl Methacrylate
    Substrates
    Irradiation
    irradiation
    Polystyrenes
    ovens
    Palladium
    Ovens
    Chemisorption
    Phase separation
    ultraviolet radiation

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Surfaces and Interfaces
    • Physics and Astronomy (miscellaneous)

    Cite this

    Fabrication of a Cu nanodot array based on electroless plating employing a diblock copolymer nanotemplate. / Asakura, Shuichi; Hozumi, Atsushi; Fuwa, Akio.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 23, No. 4, 07.2005, p. 1137-1140.

    Research output: Contribution to journalArticle

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