Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

Hidetoshi Shinohara; Hiroshi Goto; Takashi Kasahara; Jun Mizuno

doi:10.3390/mi4020157

Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

Hidetoshi Shinohara^*, Hiroshi Goto, Takashi Kasahara, Jun Mizuno

^*Corresponding author for this work

Research Organization for Nano & Life Innovation

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm² area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.

Original language	English
Pages (from-to)	157-167
Number of pages	11
Journal	Micromachines
Volume	4
Issue number	2
DOIs	https://doi.org/10.3390/mi4020157
Publication status	Published - 2013

Keywords

High-aspect-ratio
Polydimethylsiloxane
Resin mold
UV imprinting

ASJC Scopus subject areas

Control and Systems Engineering
Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.3390/mi4020157

Cite this

@article{b68ce436e1714e9e800e559324265b8d,

title = "Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting",

abstract = "This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.",

keywords = "High-aspect-ratio, Polydimethylsiloxane, Resin mold, UV imprinting",

author = "Hidetoshi Shinohara and Hiroshi Goto and Takashi Kasahara and Jun Mizuno",

year = "2013",

doi = "10.3390/mi4020157",

language = "English",

volume = "4",

pages = "157--167",

journal = "Micromachines",

issn = "2072-666X",

publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",

number = "2",

}

TY - JOUR

T1 - Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

AU - Shinohara, Hidetoshi

AU - Goto, Hiroshi

AU - Kasahara, Takashi

AU - Mizuno, Jun

PY - 2013

Y1 - 2013

N2 - This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.

AB - This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.

KW - High-aspect-ratio

KW - Polydimethylsiloxane

KW - Resin mold

KW - UV imprinting

UR - http://www.scopus.com/inward/record.url?scp=84885152242&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84885152242&partnerID=8YFLogxK

U2 - 10.3390/mi4020157

DO - 10.3390/mi4020157

M3 - Article

AN - SCOPUS:84885152242

SN - 2072-666X

VL - 4

SP - 157

EP - 167

JO - Micromachines

JF - Micromachines

IS - 2

ER -

Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

Abstract

Keywords

ASJC Scopus subject areas

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