Fabrication of a silicon oxide film by ozone and 1,1,1,3,3,3- hexamethyldisilazane (HMDS): Infrared Absorption analysis on a photochemical reaction in the gas phase
Ken Nakamura, Hidehiko Nonaka, Naoto Kameda, Tetsuya Nishiguchi, Shingo Ichimura
Research output: Contribution to journal › Article › peer-review
Dive into the research topics of 'Fabrication of a silicon oxide film by ozone and 1,1,1,3,3,3- hexamethyldisilazane (HMDS): Infrared Absorption analysis on a photochemical reaction in the gas phase'. Together they form a unique fingerprint.