Fabrication of an integrated microprobing head for fault analysis of mos integrated circuits

Shuichi Shoji; Masayoshi Esashi; Tadayuki Matsuo

doi:10.1016/0250-6874(88)80059-3

Fabrication of an integrated microprobing head for fault analysis of mos integrated circuits

Shuichi Shoji^*, Masayoshi Esashi, Tadayuki Matsuo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The fabrication of an integrated microprobing head for fault analysis of MOS ICs is described. The micrpoprobe is etched out from a silicon wafer to a tip size of about 10 μm and it has an NMOS impedance transformer intergrated very close to the tip. The input capacitance of this device is smaller than 0.1 pF and the delay time (at 50% of the final value) is lower than 100 ns at a 100 kΩ signal source resitance. This is a significant improvement n the response time of a conventional microprobe.

Original language	English
Pages (from-to)	125-132
Number of pages	8
Journal	Sensors and Actuators
Volume	14
Issue number	2
DOIs	https://doi.org/10.1016/0250-6874(88)80059-3
Publication status	Published - 1988 Jun
Externally published	Yes

ASJC Scopus subject areas

Engineering(all)

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@article{be8e49b30e274cadb7eaf278cc565609,

title = "Fabrication of an integrated microprobing head for fault analysis of mos integrated circuits",

abstract = "The fabrication of an integrated microprobing head for fault analysis of MOS ICs is described. The micrpoprobe is etched out from a silicon wafer to a tip size of about 10 μm and it has an NMOS impedance transformer intergrated very close to the tip. The input capacitance of this device is smaller than 0.1 pF and the delay time (at 50% of the final value) is lower than 100 ns at a 100 kΩ signal source resitance. This is a significant improvement n the response time of a conventional microprobe.",

author = "Shuichi Shoji and Masayoshi Esashi and Tadayuki Matsuo",

year = "1988",

month = jun,

doi = "10.1016/0250-6874(88)80059-3",

language = "English",

volume = "14",

pages = "125--132",

journal = "Sensors and Actuators",

issn = "0250-6874",

publisher = "Elsevier BV",

number = "2",

}

TY - JOUR

T1 - Fabrication of an integrated microprobing head for fault analysis of mos integrated circuits

AU - Shoji, Shuichi

AU - Esashi, Masayoshi

AU - Matsuo, Tadayuki

PY - 1988/6

Y1 - 1988/6

N2 - The fabrication of an integrated microprobing head for fault analysis of MOS ICs is described. The micrpoprobe is etched out from a silicon wafer to a tip size of about 10 μm and it has an NMOS impedance transformer intergrated very close to the tip. The input capacitance of this device is smaller than 0.1 pF and the delay time (at 50% of the final value) is lower than 100 ns at a 100 kΩ signal source resitance. This is a significant improvement n the response time of a conventional microprobe.

AB - The fabrication of an integrated microprobing head for fault analysis of MOS ICs is described. The micrpoprobe is etched out from a silicon wafer to a tip size of about 10 μm and it has an NMOS impedance transformer intergrated very close to the tip. The input capacitance of this device is smaller than 0.1 pF and the delay time (at 50% of the final value) is lower than 100 ns at a 100 kΩ signal source resitance. This is a significant improvement n the response time of a conventional microprobe.

UR - http://www.scopus.com/inward/record.url?scp=0022732721&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0022732721&partnerID=8YFLogxK

U2 - 10.1016/0250-6874(88)80059-3

DO - 10.1016/0250-6874(88)80059-3

M3 - Article

AN - SCOPUS:0022732721

SN - 0250-6874

VL - 14

SP - 125

EP - 132

JO - Sensors and Actuators

JF - Sensors and Actuators

IS - 2

ER -

Fabrication of an integrated microprobing head for fault analysis of mos integrated circuits

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