Fabrication of CoPt magnetic nanodot arrays by electrodeposition process

Takanari Ouchi, Yuki Arikawa, Takayuki Homma

    Research output: Contribution to journalArticle

    31 Citations (Scopus)


    We attempted to fabricate patterned media using the electrochemical deposition process along with nanopatterned substrates prepared by the electron beam lithography (EBL), UV nanoimprint lithography (UV-NIL), and spin-on-glass nanoimprint lithography (SOG-NIL) approaches. CoPt was electrodeposited into the nanopatterned substrates and chemical mechanical polishing was carried out to planarize the surface. It was clarified that CoPt nanodot arrays were successfully deposited into the patterned nanopores fabricated by UV-NIL and SOG-NIL as well as by EBL with high area selectivity and uniformity. The density of the CoPt nanodot arrays deposited into the nanopores fabricated by EBL was equal up to an areal recording density of 250 Gbit/in2.

    Original languageEnglish
    Pages (from-to)3104-3107
    Number of pages4
    JournalJournal of Magnetism and Magnetic Materials
    Issue number22
    Publication statusPublished - 2008 Nov



    • CoPt
    • Electrodeposition
    • Electron beam lithography
    • Nanoimprinting lithography
    • Patterned media

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Electronic, Optical and Magnetic Materials

    Cite this