Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki, Sigenobu Okada, Akio Hiraki

    Research output: Contribution to journalArticle

    7 Citations (Scopus)

    Abstract

    Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

    Original languageEnglish
    Pages (from-to)374-380
    Number of pages7
    JournalSurface and Coatings Technology
    Volume49
    Issue number1-3
    DOIs
    Publication statusPublished - 1991 Dec 10

      Fingerprint

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Condensed Matter Physics
    • Surfaces and Interfaces

    Cite this