Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa; Hiroshi Kawarada; Jin Wei; Jing Sheng Ma; Jun ichi Suzuki; Sigenobu Okada; Akio Hiraki

doi:10.1016/0257-8972(91)90086-C

Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa^*, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki, Sigenobu Okada, Akio Hiraki

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

Original language	English
Pages (from-to)	374-380
Number of pages	7
Journal	Surface and Coatings Technology
Volume	49
Issue number	1-3
DOIs	https://doi.org/10.1016/0257-8972(91)90086-C
Publication status	Published - 1991 Dec 10

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/0257-8972(91)90086-C

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title = "Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance",

abstract = "Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 {\AA} have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.",

author = "Motokazu Yuasa and Hiroshi Kawarada and Jin Wei and Ma, {Jing Sheng} and Suzuki, {Jun ichi} and Sigenobu Okada and Akio Hiraki",

note = "Funding Information: The authors wish to thank Associate Professor H. Mon and the staff members at the Ultra-High-Voltage TEM Center, Osaka University. This work was supported in part by a Grant-in-Aid for Developmental Scientific Research (63850008) from the Ministry of Education and Culture of Japan.",

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doi = "10.1016/0257-8972(91)90086-C",

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T1 - Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

AU - Yuasa, Motokazu

AU - Kawarada, Hiroshi

AU - Wei, Jin

AU - Ma, Jing Sheng

AU - Suzuki, Jun ichi

AU - Okada, Sigenobu

AU - Hiraki, Akio

N1 - Funding Information: The authors wish to thank Associate Professor H. Mon and the staff members at the Ultra-High-Voltage TEM Center, Osaka University. This work was supported in part by a Grant-in-Aid for Developmental Scientific Research (63850008) from the Ministry of Education and Culture of Japan.

PY - 1991/12/10

Y1 - 1991/12/10

N2 - Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

AB - Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

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JO - Surface and Coatings Technology

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ER -

Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Abstract

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