Fabrication of epitaxial silicides thin films by combining low-energy ion beam deposition and silicon molecular beam epitaxy

H. Shibata, Y. Makita, H. Katsumata, S. Kimura, Naoto Kobayashi, M. Hasegawa, S. Hishita, A. C. Beye, H. Takahashi, J. Tanabe, S. Uekusa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

We have developed successfully the combined ion beam and molecular beam epitaxy (CIBMBE) system with a newly designed Knudsen cell for Si effusion. The CIBMBE system was applied to the epitaxial growth of Si 1-xC x alloy thin films on Si using low-energy (100 - 300 eV) C + ion beam. Preliminary results on the characterization of the deposited films suggest high potential and reliability of the new Knudsen cell for Si effusion, as well as high ability of the CIBMBE method to produce thermally non-equilibrium materials. In addition, they indicate that the value of x decreases with increasing I C, which suggests that the selective sputtering for deposited C atoms by incident C + ion beams takes place during CIBMBE processing. Precipitates of β-SiC were also found to be formed in the deposited films, whose amount was observed to increase with increasing I C.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages517-522
Number of pages6
Volume402
Publication statusPublished - 1996
Externally publishedYes
EventProceedings of the 1995 MRS Fall Symposium - Boston, MA, USA
Duration: 1995 Nov 271995 Nov 30

Other

OtherProceedings of the 1995 MRS Fall Symposium
CityBoston, MA, USA
Period95/11/2795/11/30

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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    Shibata, H., Makita, Y., Katsumata, H., Kimura, S., Kobayashi, N., Hasegawa, M., Hishita, S., Beye, A. C., Takahashi, H., Tanabe, J., & Uekusa, S. (1996). Fabrication of epitaxial silicides thin films by combining low-energy ion beam deposition and silicon molecular beam epitaxy. In Materials Research Society Symposium - Proceedings (Vol. 402, pp. 517-522). Materials Research Society.