Fabrication of epitaxial silicides thin films by combining low-energy ion beam deposition and silicon molecular beam epitaxy

H. Shibata*, Y. Makita, H. Katsumata, S. Kimura, Naoto Kobayashi, M. Hasegawa, S. Hishita, A. C. Beye, H. Takahashi, J. Tanabe, S. Uekusa

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds