Fabrication of hafnium silicate films by plasma-enhanced chemical vapor deposition

Hiromitsu Kato*, Tomohiro Nango, Takeshi Miyagawa, Takahiro Katagiri, Yoshimichi Ohki, Kwang Soo Seol, Makoto Takiyama

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

3 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds