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Fabrication of hafnium silicate films by plasma-enhanced chemical vapor deposition
Hiromitsu Kato*, Tomohiro Nango, Takeshi Miyagawa, Takahiro Katagiri, Yoshimichi Ohki, Kwang Soo Seol, Makoto Takiyama
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
3
Citations
(Scopus)