Fabrication of heteroepitaxial diamond thin films on Ir(001)/MgO(001) substrates using antenna-edge-type microwave plasma-assisted chemical vapor deposition

Toyokatsu Fujisaki, Minoru Tachiki, Norikazu Taniyama, Minoru Kudo, Hiroshi Kawarada

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Diamond heteroepitaxial thin films were successfully synthesized on high-quality Ir(001)/MgO(001) substrates. In bias-enhanced nucleation, antenna-edge-type microwave plasma-assisted chemical vapor deposition (MPCVD) was used. Subsequently, the <001> selective and smoothing growth processes were conducted by conventional MPCVD. Reconstructed (2×1) structure patterns have been observed by reflection high-energy electron diffraction (RHEED), which indicated that the surface of the diamond film is very smooth. The mean roughness is less than 2 nm in a 10-μm2 area, as revealed by atomic force microscopy observations.

Original languageEnglish
Pages (from-to)478-481
Number of pages4
JournalDiamond and Related Materials
Volume11
Issue number3-6
DOIs
Publication statusPublished - 2002 Mar 1

    Fingerprint

Keywords

  • Chemical vapor deposition
  • Diamond
  • Heteroepitaxy
  • Iridium

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this