Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

Akiko Okada, Shuichi Shoji, Hidetoshi Shinohara, Hiromi Nishihara, Hiroshi Goto, Haruo Sunakawa, Toshiharu Matsueda, Akira Usui, Atsushi A. Yamaguchi, Jun Mizuno

Research output: Contribution to journalArticle

5 Citations (Scopus)
Original languageEnglish
Pages (from-to)69-72
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume26
Issue number1
DOIs
Publication statusPublished - 2013

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Nanoimprint lithography
Dry etching
Light emitting diodes
Fabrication

Keywords

  • Dry etching
  • Hydride vapor phase epitaxy
  • Light-emitting diode
  • Nanoimprint lithography

ASJC Scopus subject areas

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

Cite this

Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography. / Okada, Akiko; Shoji, Shuichi; Shinohara, Hidetoshi; Nishihara, Hiromi; Goto, Hiroshi; Sunakawa, Haruo; Matsueda, Toshiharu; Usui, Akira; Yamaguchi, Atsushi A.; Mizuno, Jun.

In: Journal of Photopolymer Science and Technology, Vol. 26, No. 1, 2013, p. 69-72.

Research output: Contribution to journalArticle

Okada, Akiko ; Shoji, Shuichi ; Shinohara, Hidetoshi ; Nishihara, Hiromi ; Goto, Hiroshi ; Sunakawa, Haruo ; Matsueda, Toshiharu ; Usui, Akira ; Yamaguchi, Atsushi A. ; Mizuno, Jun. / Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography. In: Journal of Photopolymer Science and Technology. 2013 ; Vol. 26, No. 1. pp. 69-72.
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author = "Akiko Okada and Shuichi Shoji and Hidetoshi Shinohara and Hiromi Nishihara and Hiroshi Goto and Haruo Sunakawa and Toshiharu Matsueda and Akira Usui and Yamaguchi, {Atsushi A.} and Jun Mizuno",
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AU - Nishihara, Hiromi

AU - Goto, Hiroshi

AU - Sunakawa, Haruo

AU - Matsueda, Toshiharu

AU - Usui, Akira

AU - Yamaguchi, Atsushi A.

AU - Mizuno, Jun

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