Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media

Hidetoshi Shinohara, Makoto Fukuhara, Tamano Hirasawa, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.

Original languageEnglish
Pages (from-to)591-596
Number of pages6
JournalJournal of Photopolymer Science and Technology
Volume21
Issue number4
DOIs
Publication statusPublished - 2008

Fingerprint

Nanoimprint lithography
Electrodeposition
Fabrication
Chemical mechanical polishing
Masks
Resins
Surface roughness
Throughput

Keywords

  • Chemical mechanical polishing
  • Electrodeposition
  • Magnetic nanodots array
  • UV nanoimprint lithography

ASJC Scopus subject areas

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media. / Shinohara, Hidetoshi; Fukuhara, Makoto; Hirasawa, Tamano; Mizuno, Jun; Shoji, Shuichi.

In: Journal of Photopolymer Science and Technology, Vol. 21, No. 4, 2008, p. 591-596.

Research output: Contribution to journalArticle

@article{b87086fccd974e55b01cbd0b3c418d2c,
title = "Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media",
abstract = "A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.",
keywords = "Chemical mechanical polishing, Electrodeposition, Magnetic nanodots array, UV nanoimprint lithography",
author = "Hidetoshi Shinohara and Makoto Fukuhara and Tamano Hirasawa and Jun Mizuno and Shuichi Shoji",
year = "2008",
doi = "10.2494/photopolymer.21.591",
language = "English",
volume = "21",
pages = "591--596",
journal = "Journal of Photopolymer Science and Technology",
issn = "0914-9244",
publisher = "Tokai University",
number = "4",

}

TY - JOUR

T1 - Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media

AU - Shinohara, Hidetoshi

AU - Fukuhara, Makoto

AU - Hirasawa, Tamano

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2008

Y1 - 2008

N2 - A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.

AB - A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.

KW - Chemical mechanical polishing

KW - Electrodeposition

KW - Magnetic nanodots array

KW - UV nanoimprint lithography

UR - http://www.scopus.com/inward/record.url?scp=50849104595&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50849104595&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.21.591

DO - 10.2494/photopolymer.21.591

M3 - Article

VL - 21

SP - 591

EP - 596

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

SN - 0914-9244

IS - 4

ER -