Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media

Hidetoshi Shinohara*, Makoto Fukuhara, Tamano Hirasawa, Jun Mizuno, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.

Original languageEnglish
Pages (from-to)591-596
Number of pages6
JournalJournal of Photopolymer Science and Technology
Volume21
Issue number4
DOIs
Publication statusPublished - 2008

Keywords

  • Chemical mechanical polishing
  • Electrodeposition
  • Magnetic nanodots array
  • UV nanoimprint lithography

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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