Fabrication of metallic nanopatterns using the vacuum type UV-NIL equipment

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.

Original languageEnglish
Pages (from-to)307-312
Number of pages6
JournalIEEJ Transactions on Electrical and Electronic Engineering
Volume2
Issue number3
DOIs
Publication statusPublished - 2007 May

Fingerprint

Nanoimprint lithography
Cobalt alloys
Resins
Vacuum
Electrodeposition
Fabrication
Thickness control
Masks
Silicon
Substrates

Keywords

  • Electrodeposition
  • Metallic nanopatterns
  • Nanoimprint
  • Photocurable resin
  • Vacuum type

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

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title = "Fabrication of metallic nanopatterns using the vacuum type UV-NIL equipment",
abstract = "Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.",
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AU - Fukuhara, Makoto

AU - Mizuno, Jun

AU - Saito, Mikiko

AU - Homma, Takayuki

AU - Shoji, Shuichi

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AB - Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.

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KW - Photocurable resin

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