Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions

K. Awazu, M. Fujimaki, S. Ishii, K. Shima, K. Nomura, Yoshimichi Ohki

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The authors introduce work on 2D and 3D nano/microfabrication with MeV ion beam irradiation on a-SiO2 and rutile single crystal TiO2. The electronic stopping of the ions is responsible for the track formation. The latent tracks atomic structure and enhanced etch rate are identified.

    Original languageEnglish
    Title of host publication2002 International Microprocesses and Nanotechnology Conference, MNC 2002
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages68-69
    Number of pages2
    ISBN (Print)4891140313, 9784891140311
    DOIs
    Publication statusPublished - 2002
    EventInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
    Duration: 2002 Nov 62002 Nov 8

    Other

    OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
    CountryJapan
    CityTokyo
    Period02/11/602/11/8

    Fingerprint

    Microfabrication
    Ion beams
    Irradiation
    Single crystals
    Fabrication
    Microstructure
    Ions

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

    Cite this

    Awazu, K., Fujimaki, M., Ishii, S., Shima, K., Nomura, K., & Ohki, Y. (2002). Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. In 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 (pp. 68-69). [1178547] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2002.1178547

    Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. / Awazu, K.; Fujimaki, M.; Ishii, S.; Shima, K.; Nomura, K.; Ohki, Yoshimichi.

    2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. p. 68-69 1178547.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Awazu, K, Fujimaki, M, Ishii, S, Shima, K, Nomura, K & Ohki, Y 2002, Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. in 2002 International Microprocesses and Nanotechnology Conference, MNC 2002., 1178547, Institute of Electrical and Electronics Engineers Inc., pp. 68-69, International Microprocesses and Nanotechnology Conference, MNC 2002, Tokyo, Japan, 02/11/6. https://doi.org/10.1109/IMNC.2002.1178547
    Awazu K, Fujimaki M, Ishii S, Shima K, Nomura K, Ohki Y. Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. In 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc. 2002. p. 68-69. 1178547 https://doi.org/10.1109/IMNC.2002.1178547
    Awazu, K. ; Fujimaki, M. ; Ishii, S. ; Shima, K. ; Nomura, K. ; Ohki, Yoshimichi. / Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. pp. 68-69
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    AU - Ohki, Yoshimichi

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