Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

R. Negishi, Tsuyoshi Hasegawa, K. Terabe, M. Aono, T. Ebihara, H. Tanaka, T. Ogawa

Research output: Contribution to journalArticle

59 Citations (Scopus)

Abstract

We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.

Original languageEnglish
Article number223111
JournalApplied Physics Letters
Volume88
Issue number22
DOIs
Publication statusPublished - 2006 May 29
Externally publishedYes

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molecular beams
electron beams
fabrication
electron tunneling
lithography
nanoparticles
high resolution

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques. / Negishi, R.; Hasegawa, Tsuyoshi; Terabe, K.; Aono, M.; Ebihara, T.; Tanaka, H.; Ogawa, T.

In: Applied Physics Letters, Vol. 88, No. 22, 223111, 29.05.2006.

Research output: Contribution to journalArticle

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