Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Nobuya Hiroshiba, Wataru Yano, Ryuji Okumura, Yo Ichikawa

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

Original languageEnglish
Pages (from-to)133-135
Number of pages3
JournalIEICE Transactions on Electronics
VolumeE98C
Issue number2
DOIs
Publication statusPublished - 2015 Feb 1
Externally publishedYes

Fingerprint

Membranes
Fabrication
Quartz
Aspect ratio
Polymers
Hot Temperature
perfluorosulfonic acid

Keywords

  • Flexible devices
  • Ion-conductive polymer
  • Nafion
  • Nanoimprinting

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting. / Hiroshiba, Nobuya; Yano, Wataru; Okumura, Ryuji; Ichikawa, Yo.

In: IEICE Transactions on Electronics, Vol. E98C, No. 2, 01.02.2015, p. 133-135.

Research output: Contribution to journalArticle

Hiroshiba, Nobuya ; Yano, Wataru ; Okumura, Ryuji ; Ichikawa, Yo. / Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting. In: IEICE Transactions on Electronics. 2015 ; Vol. E98C, No. 2. pp. 133-135.
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