Fabrication of polymer and metal three-dimensional micromesh structures

Hironobu Sato, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

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    This paper presents the fabrication methods of polymer and metal three-dimensional (3-D) micromesh structures. The photoresist micromesh structures were formed using multiple inclined UV exposure from the backside of the SU-8 coated glass substrate with metal patterns. A few micrometer-size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D macroporous-mesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3 μm in diameter were obtained by this method.

    Original languageEnglish
    Pages (from-to)8341-8344
    Number of pages4
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Issue number12
    Publication statusPublished - 2004 Dec



    • 3-D micromesh structures
    • Electroplating
    • Multiple inclined UV exposure
    • Photoresist molds
    • SU-8

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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