Fabrication of polymer and metal three-dimensional micromesh structures

Hironobu Sato, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    This paper presents the fabrication methods of polymer and metal three-dimensional (3-D) micromesh structures. The photoresist micromesh structures were formed using multiple inclined UV exposure from the backside of the SU-8 coated glass substrate with metal patterns. A few micrometer-size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D macroporous-mesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3 μm in diameter were obtained by this method.

    Original languageEnglish
    Pages (from-to)8341-8344
    Number of pages4
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume43
    Issue number12
    DOIs
    Publication statusPublished - 2004 Dec

    Fingerprint

    Electroplating
    Photoresists
    mesh
    electroplating
    photoresists
    Fabrication
    fabrication
    polymers
    Molds
    Polymers
    Metals
    metals
    Lithography
    Glass
    micrometers
    Substrates
    lithography
    porosity
    glass

    Keywords

    • 3-D micromesh structures
    • Electroplating
    • Multiple inclined UV exposure
    • Photoresist molds
    • SU-8

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Fabrication of polymer and metal three-dimensional micromesh structures. / Sato, Hironobu; Houshi, Yoshitaka; Otsuka, Toshiharu; Shoji, Shuichi.

    In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 12, 12.2004, p. 8341-8344.

    Research output: Contribution to journalArticle

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