FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION.

Yukihiro Kiyota; Kouji Numada; Isamu Kato

FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION.

Yukihiro Kiyota, Kouji Numada, Isamu Kato

Waseda University

Research output: Chapter in Book/Report/Conference proceeding › Chapter

1 Citation (Scopus)

Abstract

We have fabricated SiN films with stoichiometric composition by double tubed coaxial line type microwave plasma chemical vapor deposition and have discussed the effects of the microwave power on the film qualities.

Original language	English
Title of host publication	Transactions of the Institute of Electronics, Information and Communication Engineers, Section E (
Pages	334-335
Number of pages	2
Volume	E70
Edition	4
Publication status	Published - 1987 Apr
Event	Pap from the 1987 Natl Conv IEICE - Tokyo, Jpn Duration: 1987 Mar 26 → 1987 Mar 29

Other

Other	Pap from the 1987 Natl Conv IEICE
City	Tokyo, Jpn
Period	87/3/26 → 87/3/29

ASJC Scopus subject areas

Engineering(all)

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title = "FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION.",

abstract = "We have fabricated SiN films with stoichiometric composition by double tubed coaxial line type microwave plasma chemical vapor deposition and have discussed the effects of the microwave power on the film qualities.",

author = "Yukihiro Kiyota and Kouji Numada and Isamu Kato",

year = "1987",

month = apr,

language = "English",

volume = "E70",

pages = "334--335",

booktitle = "Transactions of the Institute of Electronics, Information and Communication Engineers, Section E (",

edition = "4",

note = "Pap from the 1987 Natl Conv IEICE ; Conference date: 26-03-1987 Through 29-03-1987",

}

TY - CHAP

T1 - FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION.

AU - Kiyota, Yukihiro

AU - Numada, Kouji

AU - Kato, Isamu

PY - 1987/4

Y1 - 1987/4

N2 - We have fabricated SiN films with stoichiometric composition by double tubed coaxial line type microwave plasma chemical vapor deposition and have discussed the effects of the microwave power on the film qualities.

AB - We have fabricated SiN films with stoichiometric composition by double tubed coaxial line type microwave plasma chemical vapor deposition and have discussed the effects of the microwave power on the film qualities.

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M3 - Chapter

AN - SCOPUS:0023332227

VL - E70

SP - 334

EP - 335

BT - Transactions of the Institute of Electronics, Information and Communication Engineers, Section E (

T2 - Pap from the 1987 Natl Conv IEICE

Y2 - 26 March 1987 through 29 March 1987

ER -