FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION.

Yukihiro Kiyota, Kouji Numada, Isamu Kato

Research output: Chapter in Book/Report/Conference proceeding › Chapter

1 Citation (Scopus)

Abstract

We have fabricated SiN films with stoichiometric composition by double tubed coaxial line type microwave plasma chemical vapor deposition and have discussed the effects of the microwave power on the film qualities.

Original languageEnglish
Title of host publicationTransactions of the Institute of Electronics, Information and Communication Engineers, Section E (
Pages334-335
Number of pages2
VolumeE70
Edition4
Publication statusPublished - 1987 Apr
EventPap from the 1987 Natl Conv IEICE - Tokyo, Jpn
Duration: 1987 Mar 26 → 1987 Mar 29

Other

OtherPap from the 1987 Natl Conv IEICE
CityTokyo, Jpn
Period87/3/26 → 87/3/29

ASJC Scopus subject areas

  • Engineering(all)

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    Kiyota, Y., Numada, K., & Kato, I. (1987). FABRICATION OF SiN FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. In Transactions of the Institute of Electronics, Information and Communication Engineers, Section E ( (4 ed., Vol. E70, pp. 334-335)