Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures

Hironobu Sato, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

This paper presents fabrication of the 3-D SU-8 fine micromesh structure and electroplated Ni micromesh structure. The SU-8 mesh structures were formed using multiple inclined UV exposure from backside of the SU-8 coated glass substrate with metal patterns. A few μm size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D micromesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3μm in diameter were obtained by this method.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages304-305
Number of pages2
Publication statusPublished - 2004 Dec 1
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 2004 Oct 262004 Oct 29

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period04/10/2604/10/29

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sato, H., Houshi, Y., Otsuka, T., & Shoji, S. (2004). Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures. In Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 304-305). (Digest of Papers - Microprocesses and Nanotechnology 2004).