Fabrication of uniform gratings on composite semiconductors using UV nanoimprint lithography

Shugo Ishizuka, Masashi Nakao, Shinro Mashiko, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

6 Citations (Scopus)


A fabrication method of uniform gratings on composite semiconductors using ultraviolet nanoimprint lithography (UV-NIL) is described. Since the grating pattern was batch transferred to the resin on substrates in this process, a high throughput fabrication process is expected. Both the dry etching process and the wet etching process can be performed for composite semiconductors patterning. The uniformity of the pattern height on a 3 inch GaAs substrate is better than the standard deviation of 2.6.

Original languageEnglish
Pages (from-to)213-217
Number of pages5
JournalJournal of Photopolymer Science and Technology
Issue number2
Publication statusPublished - 2009 Oct 26



  • Composite semiconductors
  • Gratings
  • UV nanoimprint lithography
  • Uniformity

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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