Fabrication of ZnO channel waveguides for nonlinear optical applications

Edgar Yoshio Morales Teraoka, Tomohiro Kita, Atsushi Tsukazaki, Masashi Kawasaki, Hirohito Yamada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

Original languageEnglish
Title of host publicationOxide-Based Materials and Devices II
DOIs
Publication statusPublished - 2011 Apr 27
Externally publishedYes
EventOxide-Based Materials and Devices II - San Francisco, CA, United States
Duration: 2011 Jan 232011 Jan 26

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7940
ISSN (Print)0277-786X

Other

OtherOxide-Based Materials and Devices II
CountryUnited States
CitySan Francisco, CA
Period11/1/2311/1/26

Keywords

  • Ar ion milling
  • ZnO
  • optical waveguides

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Morales Teraoka, E. Y., Kita, T., Tsukazaki, A., Kawasaki, M., & Yamada, H. (2011). Fabrication of ZnO channel waveguides for nonlinear optical applications. In Oxide-Based Materials and Devices II [79401F] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7940). https://doi.org/10.1117/12.874439