Fabrication of ZnO channel waveguides for nonlinear optical applications

Edgar Yoshio Morales Teraoka; Tomohiro Kita; Atsushi Tsukazaki; Masashi Kawasaki; Hirohito Yamada

doi:10.1117/12.874439

Fabrication of ZnO channel waveguides for nonlinear optical applications

Edgar Yoshio Morales Teraoka, Tomohiro Kita, Atsushi Tsukazaki, Masashi Kawasaki, Hirohito Yamada

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

Original language	English
Title of host publication	Oxide-Based Materials and Devices II
DOIs	https://doi.org/10.1117/12.874439
Publication status	Published - 2011
Externally published	Yes
Event	Oxide-Based Materials and Devices II - San Francisco, CA, United States Duration: 2011 Jan 23 → 2011 Jan 26

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7940
ISSN (Print)	0277-786X

Other

Other	Oxide-Based Materials and Devices II
Country/Territory	United States
City	San Francisco, CA
Period	11/1/23 → 11/1/26

Keywords

Ar ion milling
ZnO
optical waveguides

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.874439

Cite this

Fabrication of ZnO channel waveguides for nonlinear optical applications. / Morales Teraoka, Edgar Yoshio; Kita, Tomohiro; Tsukazaki, Atsushi et al.

Oxide-Based Materials and Devices II. 2011. 79401F (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7940).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Morales Teraoka, EY, Kita, T, Tsukazaki, A, Kawasaki, M & Yamada, H 2011, Fabrication of ZnO channel waveguides for nonlinear optical applications. in Oxide-Based Materials and Devices II., 79401F, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7940, Oxide-Based Materials and Devices II, San Francisco, CA, United States, 11/1/23. https://doi.org/10.1117/12.874439

@inproceedings{bb0d42ccdfa84b3db6aa592446540f83,

title = "Fabrication of ZnO channel waveguides for nonlinear optical applications",

abstract = "We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.",

keywords = "Ar ion milling, ZnO, optical waveguides",

author = "{Morales Teraoka}, {Edgar Yoshio} and Tomohiro Kita and Atsushi Tsukazaki and Masashi Kawasaki and Hirohito Yamada",

year = "2011",

doi = "10.1117/12.874439",

language = "English",

isbn = "9780819484772",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Oxide-Based Materials and Devices II",

note = "Oxide-Based Materials and Devices II ; Conference date: 23-01-2011 Through 26-01-2011",

}

TY - GEN

T1 - Fabrication of ZnO channel waveguides for nonlinear optical applications

AU - Morales Teraoka, Edgar Yoshio

AU - Kita, Tomohiro

AU - Tsukazaki, Atsushi

AU - Kawasaki, Masashi

AU - Yamada, Hirohito

PY - 2011

Y1 - 2011

N2 - We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

AB - We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

KW - Ar ion milling

KW - ZnO

KW - optical waveguides

UR - http://www.scopus.com/inward/record.url?scp=79955063309&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79955063309&partnerID=8YFLogxK

U2 - 10.1117/12.874439

DO - 10.1117/12.874439

M3 - Conference contribution

AN - SCOPUS:79955063309

SN - 9780819484772

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Oxide-Based Materials and Devices II

T2 - Oxide-Based Materials and Devices II

Y2 - 23 January 2011 through 26 January 2011

ER -

Fabrication of ZnO channel waveguides for nonlinear optical applications

Abstract

Publication series

Other

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this