Fabrication process for large size mold and alignment method for nanoimprint system

Kentaro Ishibashi, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Nanoimprint technology is considered one of the mass production methods of the display for cellular phone or notebook computer, with Anti-Reflection Structures (ARS) pattern and so on. In this case, the large size mold with nanometer order pattern is very important. Then, we describe the fabrication process for large size mold, and the alignment method for UV nanoimprint system. We developed the original mold fabrication process using nanoimprint method and etching techniques. In 66 × 45 mm2 area, 200nm period seamless patterns were formed using this process. And, we constructed original alignment system that consists of the CCD-camera system, X-Y-θ table, method of moird fringe, and image processing system, because the accuracy of pattern connection depends on the alignment method. This alignment system accuracy was within 20nm.

Original languageEnglish
Pages (from-to)363-368
Number of pages6
JournalIEEJ Transactions on Sensors and Micromachines
Volume130
Issue number8
DOIs
Publication statusPublished - 2010

Fingerprint

Fabrication
Laptop computers
CCD cameras
Etching
Image processing
Display devices

Keywords

  • Alignment system
  • CCD camera
  • Fringes
  • Large size mold fabrication
  • Moiré
  • Nanoimprint
  • Table
  • X-Y-θ

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering

Cite this

Fabrication process for large size mold and alignment method for nanoimprint system. / Ishibashi, Kentaro; Kokubo, Mitsunori; Goto, Hiroshi; Mizuno, Jun; Shoji, Shuichi.

In: IEEJ Transactions on Sensors and Micromachines, Vol. 130, No. 8, 2010, p. 363-368.

Research output: Contribution to journalArticle

@article{80390d1a063b42edb76c50df7686c156,
title = "Fabrication process for large size mold and alignment method for nanoimprint system",
abstract = "Nanoimprint technology is considered one of the mass production methods of the display for cellular phone or notebook computer, with Anti-Reflection Structures (ARS) pattern and so on. In this case, the large size mold with nanometer order pattern is very important. Then, we describe the fabrication process for large size mold, and the alignment method for UV nanoimprint system. We developed the original mold fabrication process using nanoimprint method and etching techniques. In 66 × 45 mm2 area, 200nm period seamless patterns were formed using this process. And, we constructed original alignment system that consists of the CCD-camera system, X-Y-θ table, method of moird fringe, and image processing system, because the accuracy of pattern connection depends on the alignment method. This alignment system accuracy was within 20nm.",
keywords = "Alignment system, CCD camera, Fringes, Large size mold fabrication, Moir{\'e}, Nanoimprint, Table, X-Y-θ",
author = "Kentaro Ishibashi and Mitsunori Kokubo and Hiroshi Goto and Jun Mizuno and Shuichi Shoji",
year = "2010",
doi = "10.1541/ieejsmas.130.363",
language = "English",
volume = "130",
pages = "363--368",
journal = "IEEJ Transactions on Sensors and Micromachines",
issn = "1341-8939",
publisher = "The Institute of Electrical Engineers of Japan",
number = "8",

}

TY - JOUR

T1 - Fabrication process for large size mold and alignment method for nanoimprint system

AU - Ishibashi, Kentaro

AU - Kokubo, Mitsunori

AU - Goto, Hiroshi

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2010

Y1 - 2010

N2 - Nanoimprint technology is considered one of the mass production methods of the display for cellular phone or notebook computer, with Anti-Reflection Structures (ARS) pattern and so on. In this case, the large size mold with nanometer order pattern is very important. Then, we describe the fabrication process for large size mold, and the alignment method for UV nanoimprint system. We developed the original mold fabrication process using nanoimprint method and etching techniques. In 66 × 45 mm2 area, 200nm period seamless patterns were formed using this process. And, we constructed original alignment system that consists of the CCD-camera system, X-Y-θ table, method of moird fringe, and image processing system, because the accuracy of pattern connection depends on the alignment method. This alignment system accuracy was within 20nm.

AB - Nanoimprint technology is considered one of the mass production methods of the display for cellular phone or notebook computer, with Anti-Reflection Structures (ARS) pattern and so on. In this case, the large size mold with nanometer order pattern is very important. Then, we describe the fabrication process for large size mold, and the alignment method for UV nanoimprint system. We developed the original mold fabrication process using nanoimprint method and etching techniques. In 66 × 45 mm2 area, 200nm period seamless patterns were formed using this process. And, we constructed original alignment system that consists of the CCD-camera system, X-Y-θ table, method of moird fringe, and image processing system, because the accuracy of pattern connection depends on the alignment method. This alignment system accuracy was within 20nm.

KW - Alignment system

KW - CCD camera

KW - Fringes

KW - Large size mold fabrication

KW - Moiré

KW - Nanoimprint

KW - Table

KW - X-Y-θ

UR - http://www.scopus.com/inward/record.url?scp=77956960400&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77956960400&partnerID=8YFLogxK

U2 - 10.1541/ieejsmas.130.363

DO - 10.1541/ieejsmas.130.363

M3 - Article

AN - SCOPUS:77956960400

VL - 130

SP - 363

EP - 368

JO - IEEJ Transactions on Sensors and Micromachines

JF - IEEJ Transactions on Sensors and Micromachines

SN - 1341-8939

IS - 8

ER -