Fabrication process for large size mold and alignment method for nanoimprint system

Kentaro Ishibashi*, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


Nanoimprint technology is considered one of the mass production methods of the display for cellular phone or notebook computer, with Anti-Reflection Structures (ARS) pattern and so on. In this case, the large size mold with nanometer order pattern is very important. Then, we describe the fabrication process for large size mold, and the alignment method for UV nanoimprint system. We developed the original mold fabrication process using nanoimprint method and etching techniques. In 66 × 45 mm2 area, 200nm period seamless patterns were formed using this process. And, we constructed original alignment system that consists of the CCD-camera system, X-Y-θ table, method of moird fringe, and image processing system, because the accuracy of pattern connection depends on the alignment method. This alignment system accuracy was within 20nm.

Original languageEnglish
Pages (from-to)363-368
Number of pages6
Journalieej transactions on sensors and micromachines
Issue number8
Publication statusPublished - 2010


  • Alignment system
  • CCD camera
  • Fringes
  • Large size mold fabrication
  • Moiré
  • Nanoimprint
  • Table
  • X-Y-θ

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering


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