Abstract
The photopatterning of CdSe quantum dots (QDs) films is facilitated by preparing defect-rich QDs on selective sites on the film. A key step is UV irradiation in the presence of a polar solvent such as methanol in situ as a "developer" which readily dissolves trioctylphosphine oxide (TOPO) but not the QDs. This results in a dramatically reduced photopatterning time and irradiation intensity requirement. The optical property changes were examined by UV-vis and fluorescence spectroscopy. Furthermore, the photo-oxidized pattern of the CdSe QD film was readily observed by fluorescence microscopy. The chemical change due to attenuation of the P=O vibration of TOPO (due to its removal) could be detected by FT-IR imaging or FT-IR chemical mapping. Thus, the protocol is a simple yet effective way of patterning PL properties of QD films at much reduced exposure time compared to previously reported methods. It may find utility for a host of cell-based film assays and PL display device applications at various resolutions.
Original language | English |
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Pages (from-to) | 4363-4369 |
Number of pages | 7 |
Journal | ACS Applied Materials and Interfaces |
Volume | 3 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2011 Nov 23 |
Externally published | Yes |
Keywords
- CdSe
- hybrid
- micropatterning
- photobleaching
- quantum dots
- UV irradiation
ASJC Scopus subject areas
- Materials Science(all)