Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)19-24
Number of pages6
JournalJapanese Journal of Applied Physics
Volume18
Issue number1
DOIs
Publication statusPublished - 1979
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Fast etching phenomenon of plasma-silicon nitride films over substrate steps. / Hiraiwa, Atsushi; Mukai, Kiichiro; Harada, Seiki; Yoshimi, Takeo; Itoh, Satoru.

In: Japanese Journal of Applied Physics, Vol. 18, No. 1, 1979, p. 19-24.

Research output: Contribution to journalArticle

Hiraiwa, Atsushi ; Mukai, Kiichiro ; Harada, Seiki ; Yoshimi, Takeo ; Itoh, Satoru. / Fast etching phenomenon of plasma-silicon nitride films over substrate steps. In: Japanese Journal of Applied Physics. 1979 ; Vol. 18, No. 1. pp. 19-24.
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