Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	19-24
Number of pages	6
Journal	Japanese Journal of Applied Physics
Volume	18
Issue number	1
DOIs	https://doi.org/10.1143/JJAP.18.191
Publication status	Published - 1979
Externally published	Yes

ASJC Scopus subject areas

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title = "Fast etching phenomenon of plasma-silicon nitride films over substrate steps",

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AU - Hiraiwa, Atsushi

AU - Mukai, Kiichiro

AU - Harada, Seiki

AU - Yoshimi, Takeo

AU - Itoh, Satoru

PY - 1979

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

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