Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)19-24
Number of pages6
JournalJapanese Journal of Applied Physics
Volume18
Issue number1
DOIs
Publication statusPublished - 1979
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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