Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

Research output: Contribution to journal › Article

Original languageEnglish
Pages (from-to)19-24
Number of pages6
JournalJapanese Journal of Applied Physics
Volume18
Issue number1
DOIs
Publication statusPublished - 1979
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Fast etching phenomenon of plasma-silicon nitride films over substrate steps. / Hiraiwa, Atsushi; Mukai, Kiichiro; Harada, Seiki; Yoshimi, Takeo; Itoh, Satoru.

In: Japanese Journal of Applied Physics, Vol. 18, No. 1, 1979, p. 19-24.

Research output: Contribution to journal › Article

Hiraiwa, A, Mukai, K, Harada, S, Yoshimi, T & Itoh, S 1979, 'Fast etching phenomenon of plasma-silicon nitride films over substrate steps', Japanese Journal of Applied Physics, vol. 18, no. 1, pp. 19-24. https://doi.org/10.1143/JJAP.18.191
Hiraiwa A, Mukai K, Harada S, Yoshimi T, Itoh S. Fast etching phenomenon of plasma-silicon nitride films over substrate steps. Japanese Journal of Applied Physics. 1979;18(1):19-24. https://doi.org/10.1143/JJAP.18.191
Hiraiwa, Atsushi ; Mukai, Kiichiro ; Harada, Seiki ; Yoshimi, Takeo ; Itoh, Satoru. / Fast etching phenomenon of plasma-silicon nitride films over substrate steps. In: Japanese Journal of Applied Physics. 1979 ; Vol. 18, No. 1. pp. 19-24.
@article{769577f1232b4ed28904c6fa08d9cb33,
title = "Fast etching phenomenon of plasma-silicon nitride films over substrate steps",
author = "Atsushi Hiraiwa and Kiichiro Mukai and Seiki Harada and Takeo Yoshimi and Satoru Itoh",
year = "1979",
doi = "10.1143/JJAP.18.191",
language = "English",
volume = "18",
pages = "19--24",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "1",

}

TY - JOUR

T1 - Fast etching phenomenon of plasma-silicon nitride films over substrate steps

AU - Hiraiwa, Atsushi

AU - Mukai, Kiichiro

AU - Harada, Seiki

AU - Yoshimi, Takeo

AU - Itoh, Satoru

PY - 1979

Y1 - 1979

UR - http://www.scopus.com/inward/record.url?scp=84957186117&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84957186117&partnerID=8YFLogxK

U2 - 10.1143/JJAP.18.191

DO - 10.1143/JJAP.18.191

M3 - Article

AN - SCOPUS:84957186117

VL - 18

SP - 19

EP - 24

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1

ER -

Access to Document