Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures

Atsushi Tackeuchi; Shunichi Muto; Tsuguo Inata; Toshio Fujii

doi:10.1063/1.105106

Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures

Atsushi Tackeuchi^*, Shunichi Muto, Tsuguo Inata, Toshio Fujii

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.

Original language	English
Pages (from-to)	1670-1672
Number of pages	3
Journal	Applied Physics Letters
Volume	58
Issue number	15
DOIs	https://doi.org/10.1063/1.105106
Publication status	Published - 1991
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.105106

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title = "Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures",

abstract = "This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.",

author = "Atsushi Tackeuchi and Shunichi Muto and Tsuguo Inata and Toshio Fujii",

year = "1991",

doi = "10.1063/1.105106",

language = "English",

volume = "58",

pages = "1670--1672",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "15",

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TY - JOUR

T1 - Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures

AU - Tackeuchi, Atsushi

AU - Muto, Shunichi

AU - Inata, Tsuguo

AU - Fujii, Toshio

PY - 1991

Y1 - 1991

N2 - This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.

AB - This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.

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U2 - 10.1063/1.105106

DO - 10.1063/1.105106

M3 - Article

AN - SCOPUS:0001149969

SN - 0003-6951

VL - 58

SP - 1670

EP - 1672

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 15

ER -

Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures

Abstract

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