Field electron emission under extreme high vacuum and extreme high vacuum technology of Korea

Boklar Cho, S. Chung, Chuhei Oshima

Research output: Contribution to journalArticle

Abstract

An extreme high vacuum field emission microscope (XHV-FEM) was constructed for the study of inherent fluctuations of field emission (FE) current. The damping and fluctuation behaviors of FE from clean W(111) tips at 90 K were observed using the XHVFEM. The noise of FE currents ranging from 10 pA to 100 μA was measured under ∼7 × 10-10 Pa. Stepwise features were routinely observed in damping curves of the FE current, indicating remarkable sensitivity of the FE current measuring system. The lowest frequency measurement of shot noise was recorded even at 4 Hz. Semilogarithmic damping curves of FE currents were linear in our thoroughly degassed XHV-FE system. The slope of semilogarithmic damping curves was linearly proportional to the operation pressure, suggesting a method of measuring pressure in an XHV range. An introduction to the XHV technology of Korea is also presented.

Original languageEnglish
Pages (from-to)635-641
Number of pages7
JournalJournal of the Vacuum Society of Japan
Volume51
Issue number10
Publication statusPublished - 2008

Fingerprint

Vacuum technology
Korea
Electron emission
high vacuum
Field emission
electron emission
field emission
Vacuum
Damping
damping
Field emission microscopes
curves
Shot noise
frequency measurement
shot noise
Finite element method
microscopes
slopes
low frequencies

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

Cite this

Field electron emission under extreme high vacuum and extreme high vacuum technology of Korea. / Cho, Boklar; Chung, S.; Oshima, Chuhei.

In: Journal of the Vacuum Society of Japan, Vol. 51, No. 10, 2008, p. 635-641.

Research output: Contribution to journalArticle

Cho, Boklar ; Chung, S. ; Oshima, Chuhei. / Field electron emission under extreme high vacuum and extreme high vacuum technology of Korea. In: Journal of the Vacuum Society of Japan. 2008 ; Vol. 51, No. 10. pp. 635-641.
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