Focusing of ion beams by using a capillary

Kouji Watanabe, Kouji Kondou, Yukio Fujiwara, Naoaki Saito, Hidehiko Nonaka, Shingo Ichimura

Research output: Contribution to journalArticle


A ruby capillary which is available as an industrial product for the wire bonding machines for the microelectronics has been adopted to focus ion beams passively for the first time. An Ar+ ion beam with a beam current density of 3 × 10-6 at an energy of 4 keV has been found to penetrate steadily the ruby capillary and the behavior of the beam through the capillary has been investigated in details. It has been also found that a large amount of secondary electrons are generated when the ion beam hits the capillary and a negative bias should be applied to the Faraday cup to measure the ion beam current through the capillary though the positive ion beam is to be measured.

Original languageEnglish
Pages (from-to)117-120
Number of pages4
JournalJournal of the Vacuum Society of Japan
Issue number3
Publication statusPublished - 2009
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation
  • Surfaces and Interfaces
  • Spectroscopy

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  • Cite this

    Watanabe, K., Kondou, K., Fujiwara, Y., Saito, N., Nonaka, H., & Ichimura, S. (2009). Focusing of ion beams by using a capillary. Journal of the Vacuum Society of Japan, 52(3), 117-120.