Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles facing the substrates can be replicated with soluble silicate species generated from the Si substrates under basic conditions. In this study, concentrically arranged nanogrooves with a sub-5 nm periodicity were prepared on Si substrates by replicating the outermost surfaces of bent micelles guided by silica particles. The Si substrates, where silica particles and surfactants films were deposited, were exposed to an NH3-water vapor mixture. During the vapor treatment, cylindrical micelles became arranged in concentric patterns centered on the silica particles, and their outermost surfaces facing the substrates were replicated by soluble silicate species on the Si substrates. The thinness of the surfactant film on the substrate is crucial for the formation of concentric silica nanogrooves because the out-of-plane orientations of the micelles are suppressed at the interface. Surprisingly, the domains of the concentric silica nanogrooves spread to much larger areas than the maximum cross-sectional areas of the particles, and the size of the domains increased linearly with the radii of the particles. The extension of concentric nanogrooves is discussed on the basis of the orientational elastic energies of the micelles around one silica particle. This study of the formation of bent nanogrooves guided by the outlines of readily deposited nanoscale objects provides a new nanostructure-guiding process.

    Original languageEnglish
    Pages (from-to)1733-1741
    Number of pages9
    JournalLangmuir
    Volume34
    Issue number4
    DOIs
    Publication statusPublished - 2018 Jan 30

    Fingerprint

    curved surfaces
    Silicon Dioxide
    Silica
    silicon dioxide
    Micelles
    Substrates
    micelles
    Silicates
    Surface-Active Agents
    Particles (particulate matter)
    periodic variations
    silicates
    Surface active agents
    surfactants
    nanofabrication
    Steam
    Nanotechnology
    Water vapor
    water vapor
    Nanostructures

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Spectroscopy
    • Electrochemistry

    Cite this

    Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles. / Hara, Shintaro; Hirota, Keiya; Tabe, Yuka; Wada, Hiroaki; Shimojima, Atsushi; Kuroda, Kazuyuki.

    In: Langmuir, Vol. 34, No. 4, 30.01.2018, p. 1733-1741.

    Research output: Contribution to journalArticle

    @article{bd4a40dfda47485db45ccc9a8f994ec4,
    title = "Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles",
    abstract = "The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles facing the substrates can be replicated with soluble silicate species generated from the Si substrates under basic conditions. In this study, concentrically arranged nanogrooves with a sub-5 nm periodicity were prepared on Si substrates by replicating the outermost surfaces of bent micelles guided by silica particles. The Si substrates, where silica particles and surfactants films were deposited, were exposed to an NH3-water vapor mixture. During the vapor treatment, cylindrical micelles became arranged in concentric patterns centered on the silica particles, and their outermost surfaces facing the substrates were replicated by soluble silicate species on the Si substrates. The thinness of the surfactant film on the substrate is crucial for the formation of concentric silica nanogrooves because the out-of-plane orientations of the micelles are suppressed at the interface. Surprisingly, the domains of the concentric silica nanogrooves spread to much larger areas than the maximum cross-sectional areas of the particles, and the size of the domains increased linearly with the radii of the particles. The extension of concentric nanogrooves is discussed on the basis of the orientational elastic energies of the micelles around one silica particle. This study of the formation of bent nanogrooves guided by the outlines of readily deposited nanoscale objects provides a new nanostructure-guiding process.",
    author = "Shintaro Hara and Keiya Hirota and Yuka Tabe and Hiroaki Wada and Atsushi Shimojima and Kazuyuki Kuroda",
    year = "2018",
    month = "1",
    day = "30",
    doi = "10.1021/acs.langmuir.7b03777",
    language = "English",
    volume = "34",
    pages = "1733--1741",
    journal = "Langmuir",
    issn = "0743-7463",
    publisher = "American Chemical Society",
    number = "4",

    }

    TY - JOUR

    T1 - Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles

    AU - Hara, Shintaro

    AU - Hirota, Keiya

    AU - Tabe, Yuka

    AU - Wada, Hiroaki

    AU - Shimojima, Atsushi

    AU - Kuroda, Kazuyuki

    PY - 2018/1/30

    Y1 - 2018/1/30

    N2 - The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles facing the substrates can be replicated with soluble silicate species generated from the Si substrates under basic conditions. In this study, concentrically arranged nanogrooves with a sub-5 nm periodicity were prepared on Si substrates by replicating the outermost surfaces of bent micelles guided by silica particles. The Si substrates, where silica particles and surfactants films were deposited, were exposed to an NH3-water vapor mixture. During the vapor treatment, cylindrical micelles became arranged in concentric patterns centered on the silica particles, and their outermost surfaces facing the substrates were replicated by soluble silicate species on the Si substrates. The thinness of the surfactant film on the substrate is crucial for the formation of concentric silica nanogrooves because the out-of-plane orientations of the micelles are suppressed at the interface. Surprisingly, the domains of the concentric silica nanogrooves spread to much larger areas than the maximum cross-sectional areas of the particles, and the size of the domains increased linearly with the radii of the particles. The extension of concentric nanogrooves is discussed on the basis of the orientational elastic energies of the micelles around one silica particle. This study of the formation of bent nanogrooves guided by the outlines of readily deposited nanoscale objects provides a new nanostructure-guiding process.

    AB - The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles facing the substrates can be replicated with soluble silicate species generated from the Si substrates under basic conditions. In this study, concentrically arranged nanogrooves with a sub-5 nm periodicity were prepared on Si substrates by replicating the outermost surfaces of bent micelles guided by silica particles. The Si substrates, where silica particles and surfactants films were deposited, were exposed to an NH3-water vapor mixture. During the vapor treatment, cylindrical micelles became arranged in concentric patterns centered on the silica particles, and their outermost surfaces facing the substrates were replicated by soluble silicate species on the Si substrates. The thinness of the surfactant film on the substrate is crucial for the formation of concentric silica nanogrooves because the out-of-plane orientations of the micelles are suppressed at the interface. Surprisingly, the domains of the concentric silica nanogrooves spread to much larger areas than the maximum cross-sectional areas of the particles, and the size of the domains increased linearly with the radii of the particles. The extension of concentric nanogrooves is discussed on the basis of the orientational elastic energies of the micelles around one silica particle. This study of the formation of bent nanogrooves guided by the outlines of readily deposited nanoscale objects provides a new nanostructure-guiding process.

    UR - http://www.scopus.com/inward/record.url?scp=85041446722&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=85041446722&partnerID=8YFLogxK

    U2 - 10.1021/acs.langmuir.7b03777

    DO - 10.1021/acs.langmuir.7b03777

    M3 - Article

    VL - 34

    SP - 1733

    EP - 1741

    JO - Langmuir

    JF - Langmuir

    SN - 0743-7463

    IS - 4

    ER -