Abstract
Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20 nm, was achieved.
| Original language | English |
|---|---|
| Pages (from-to) | 176-177 |
| Number of pages | 2 |
| Journal | Chemistry Letters |
| Volume | 33 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2004 Feb 5 |
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ASJC Scopus subject areas
- Chemistry(all)
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Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography. / Niwa, Daisuke; Omichi, Kaoru; Motohashi, Norikazu; Homma, Takayuki; Osaka, Tetsuya.
In: Chemistry Letters, Vol. 33, No. 2, 05.02.2004, p. 176-177.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography
AU - Niwa, Daisuke
AU - Omichi, Kaoru
AU - Motohashi, Norikazu
AU - Homma, Takayuki
AU - Osaka, Tetsuya
PY - 2004/2/5
Y1 - 2004/2/5
N2 - Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20 nm, was achieved.
AB - Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20 nm, was achieved.
UR - http://www.scopus.com/inward/record.url?scp=1942454893&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=1942454893&partnerID=8YFLogxK
U2 - 10.1246/cl.2004.176
DO - 10.1246/cl.2004.176
M3 - Article
AN - SCOPUS:1942454893
VL - 33
SP - 176
EP - 177
JO - Chemistry Letters
JF - Chemistry Letters
SN - 0366-7022
IS - 2
ER -