Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography

Daisuke Niwa, Kaoru Omichi, Norikazu Motohashi, Takayuki Homma, Tetsuya Osaka

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20 nm, was achieved.

Original languageEnglish
Pages (from-to)176-177
Number of pages2
JournalChemistry Letters
Volume33
Issue number2
DOIs
Publication statusPublished - 2004 Feb 5

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Electron beam lithography
Oligonucleotides
Monolayers

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography. / Niwa, Daisuke; Omichi, Kaoru; Motohashi, Norikazu; Homma, Takayuki; Osaka, Tetsuya.

In: Chemistry Letters, Vol. 33, No. 2, 05.02.2004, p. 176-177.

Research output: Contribution to journalArticle

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