Formation of soft magnetic thin films by means of electrochemical methods

Tetsuya Osaka, Atsushi Sugiyama, Toru Asahi, Jun Kawaji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Development of CoFe soft magnetic thin film for a recording head core and a CoNiFeB soft magnetic underlayer for double-layered perpendicular recording media by means of electrochemical methods are reviewed. The highest B s value of 2.4 T was attained with electrodeposited Co 35Fe65 films by avoiding the formation of Fe3+ in the bath during the electrodeposition. The Hc value lower than 6 Oe was attained with maintaining the Bs at 2.4 T by combining the electrodeposition using pulsed current with a post-annealing process. On the other hand, the CoNiFeB film could be formed on a 2.5 inch-diameter Si single crystal disk with sufficient uniformity. The magnetic domain structure of CoNiFeB was able to be controlled by preparation conditions in electroless deposition, e.g. rotating speed of the disk substrate and application of external magnetic field. Consequently, the CoNiFeB soft magnetic underlayer exhibiting no spike noise could be prepared by optimizing these conditions.

Original languageEnglish
Title of host publicationProceedings - Electrochemical Society
Pages144-158
Number of pages15
VolumePV 2004-23
Publication statusPublished - 2006
Event206th ECS Meeting - Honolulu, HI
Duration: 2004 Oct 52004 Oct 8

Other

Other206th ECS Meeting
CityHonolulu, HI
Period04/10/504/10/8

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Osaka, T., Sugiyama, A., Asahi, T., & Kawaji, J. (2006). Formation of soft magnetic thin films by means of electrochemical methods. In Proceedings - Electrochemical Society (Vol. PV 2004-23, pp. 144-158)