Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe, Takahiko Otani

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

Original languageEnglish
Pages (from-to)424-430
Number of pages7
JournalJournal of Crystal Growth
Volume276
Issue number3-4
DOIs
Publication statusPublished - 2005 Apr 1
Externally publishedYes

Fingerprint

Glass
glass
Substrates
alignment
Crystallites
Epitaxial growth
Magnetron sputtering
Sputtering
Poles
Microscopes
Textures
Ions
Oxygen
oxygen ions
Plasmas
X rays
epitaxy
crystallites
magnetron sputtering
poles

Keywords

  • A1. X-ray diffraction
  • A3. Physical vapor deposition processes
  • B1. Zinc compounds
  • B2. Piezoelectric materials

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates. / Yanagitani, Takahiko; Matsukawa, Mami; Watanabe, Yoshiaki; Otani, Takahiko.

In: Journal of Crystal Growth, Vol. 276, No. 3-4, 01.04.2005, p. 424-430.

Research output: Contribution to journalArticle

Yanagitani, Takahiko ; Matsukawa, Mami ; Watanabe, Yoshiaki ; Otani, Takahiko. / Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates. In: Journal of Crystal Growth. 2005 ; Vol. 276, No. 3-4. pp. 424-430.
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