Frequency-resolved high-harmonic wavefront characterization

E. Frumker, G. G. Paulus, Hiromichi Niikura, D. M. Villeneuve, P. B. Corkum

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

Original languageEnglish
Pages (from-to)3026-3028
Number of pages3
JournalOptics Letters
Volume34
Issue number19
DOIs
Publication statusPublished - 2009 Oct 1
Externally publishedYes

Fingerprint

harmonics
radiation
slits
diffraction patterns
spectrometers
wavelengths
x rays

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Frumker, E., Paulus, G. G., Niikura, H., Villeneuve, D. M., & Corkum, P. B. (2009). Frequency-resolved high-harmonic wavefront characterization. Optics Letters, 34(19), 3026-3028. https://doi.org/10.1364/OL.34.003026

Frequency-resolved high-harmonic wavefront characterization. / Frumker, E.; Paulus, G. G.; Niikura, Hiromichi; Villeneuve, D. M.; Corkum, P. B.

In: Optics Letters, Vol. 34, No. 19, 01.10.2009, p. 3026-3028.

Research output: Contribution to journalArticle

Frumker, E, Paulus, GG, Niikura, H, Villeneuve, DM & Corkum, PB 2009, 'Frequency-resolved high-harmonic wavefront characterization', Optics Letters, vol. 34, no. 19, pp. 3026-3028. https://doi.org/10.1364/OL.34.003026
Frumker E, Paulus GG, Niikura H, Villeneuve DM, Corkum PB. Frequency-resolved high-harmonic wavefront characterization. Optics Letters. 2009 Oct 1;34(19):3026-3028. https://doi.org/10.1364/OL.34.003026
Frumker, E. ; Paulus, G. G. ; Niikura, Hiromichi ; Villeneuve, D. M. ; Corkum, P. B. / Frequency-resolved high-harmonic wavefront characterization. In: Optics Letters. 2009 ; Vol. 34, No. 19. pp. 3026-3028.
@article{d1c1133e3fac4dd0b09324885b6d4d93,
title = "Frequency-resolved high-harmonic wavefront characterization",
abstract = "We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.",
author = "E. Frumker and Paulus, {G. G.} and Hiromichi Niikura and Villeneuve, {D. M.} and Corkum, {P. B.}",
year = "2009",
month = "10",
day = "1",
doi = "10.1364/OL.34.003026",
language = "English",
volume = "34",
pages = "3026--3028",
journal = "Optics Letters",
issn = "0146-9592",
publisher = "The Optical Society",
number = "19",

}

TY - JOUR

T1 - Frequency-resolved high-harmonic wavefront characterization

AU - Frumker, E.

AU - Paulus, G. G.

AU - Niikura, Hiromichi

AU - Villeneuve, D. M.

AU - Corkum, P. B.

PY - 2009/10/1

Y1 - 2009/10/1

N2 - We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

AB - We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

UR - http://www.scopus.com/inward/record.url?scp=70349680653&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70349680653&partnerID=8YFLogxK

U2 - 10.1364/OL.34.003026

DO - 10.1364/OL.34.003026

M3 - Article

C2 - 19794804

AN - SCOPUS:70349680653

VL - 34

SP - 3026

EP - 3028

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 19

ER -