Frequency-resolved high-harmonic wavefront characterization

E. Frumker, G. G. Paulus, Hiromichi Niikura, D. M. Villeneuve, P. B. Corkum

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Abstract

We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

Original languageEnglish
Pages (from-to)3026-3028
Number of pages3
JournalOptics Letters
Volume34
Issue number19
DOIs
Publication statusPublished - 2009 Oct 1
Externally publishedYes

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ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Frumker, E., Paulus, G. G., Niikura, H., Villeneuve, D. M., & Corkum, P. B. (2009). Frequency-resolved high-harmonic wavefront characterization. Optics Letters, 34(19), 3026-3028. https://doi.org/10.1364/OL.34.003026