Growth of epitaxial site-engineered Bi4Ti3O12-basded thin films by MOCVD and their characterization

Hiroshi Funakubo*, Tomohiro Sakai, Takayuki Watanabe, Minoru Osada, Masato Kakihana, Keisuke Saito, Yuji Noguchi, Masaru Miyayama

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science

Chemical Compounds