Hall effect measurements at low temperature of arsenic implanted into 4H-silicon carbide

J. Senzaki*, K. Fukuda, Y. Ishida, Y. Tanaka, H. Tanoue, Naoto Kobayashi, T. Tanaka, K. Arai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science

Chemical Compounds