Heteroepitaxial diamond thin film growth on Ir(0 0 1)/MgO(0 0 1) substrate by antenna-edge plasma assisted chemical vapor deposition

Minoru Tachiki, Toyokatsu Fujisaki, Norikazu Taniyama, Minoru Kudo, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    Heteroepitaxial (0 0 1) diamond films are successfully grown on high-quality (0 0 1)Ir/(0 0 1)MgO substrates. To enhance the epitaxial nucleation and growth of the diamond, antenna-edge microwave plasma chemical vapor deposition (MPCVD) has been used as a bias enhanced nucleation step. Subsequently, the diamond growth step is performed using conventional MPCVD in a 〈001〉 fast growth mode. Scanning electron microscope (SEM) observation and reflection high-energy electron diffraction (RHEED) reveals the epitaxial ordering of deposited film in several millimeters square area.

    Original languageEnglish
    Pages (from-to)1277-1280
    Number of pages4
    JournalJournal of Crystal Growth
    Volume237-239
    Issue number1-4 II
    DOIs
    Publication statusPublished - 2002 Apr

    Fingerprint

    Diamond films
    Film growth
    Chemical vapor deposition
    Diamond
    antennas
    diamonds
    vapor deposition
    Antennas
    Plasmas
    Thin films
    Diamonds
    Nucleation
    Substrates
    thin films
    Electron reflection
    Microwaves
    nucleation
    microwaves
    Reflection high energy electron diffraction
    diamond films

    Keywords

    • A1. Nucleation
    • A3. Chemical vapor deposition processes
    • A3. Vapor-phase epitaxy
    • B1. Diamond

    ASJC Scopus subject areas

    • Condensed Matter Physics

    Cite this

    Heteroepitaxial diamond thin film growth on Ir(0 0 1)/MgO(0 0 1) substrate by antenna-edge plasma assisted chemical vapor deposition. / Tachiki, Minoru; Fujisaki, Toyokatsu; Taniyama, Norikazu; Kudo, Minoru; Kawarada, Hiroshi.

    In: Journal of Crystal Growth, Vol. 237-239, No. 1-4 II, 04.2002, p. 1277-1280.

    Research output: Contribution to journalArticle

    Tachiki, Minoru ; Fujisaki, Toyokatsu ; Taniyama, Norikazu ; Kudo, Minoru ; Kawarada, Hiroshi. / Heteroepitaxial diamond thin film growth on Ir(0 0 1)/MgO(0 0 1) substrate by antenna-edge plasma assisted chemical vapor deposition. In: Journal of Crystal Growth. 2002 ; Vol. 237-239, No. 1-4 II. pp. 1277-1280.
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    abstract = "Heteroepitaxial (0 0 1) diamond films are successfully grown on high-quality (0 0 1)Ir/(0 0 1)MgO substrates. To enhance the epitaxial nucleation and growth of the diamond, antenna-edge microwave plasma chemical vapor deposition (MPCVD) has been used as a bias enhanced nucleation step. Subsequently, the diamond growth step is performed using conventional MPCVD in a 〈001〉 fast growth mode. Scanning electron microscope (SEM) observation and reflection high-energy electron diffraction (RHEED) reveals the epitaxial ordering of deposited film in several millimeters square area.",
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    AU - Kudo, Minoru

    AU - Kawarada, Hiroshi

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