Heteroepitaxial diamond thin film growth on Ir(001)/MgO(001) substrate by antenna-edge plasma assisted chemical vapor deposition (St. Elmo CVD)

Minoru Tachiki, Toyokatsu Fujisaki, Norikazu Taniyama, Minoru Kudo, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    Heteroepitaxial (001)diamond films are successfully grown on high-quality (001)Ir/(001)MgO substrates. To enhance the epitaxial nucleation and growth of the diamond, antenna-edge microwave plasma chemical vapor deposition (MPCVD) has been used in the bias enhanced nucleation step. Subsequently, the diamond growth step is performed using conventional MPCVD in the <001> fast growth mode. Scanning electron microscope (SEM) observation and reflection high-energy electron diffraction (RHEED) reveal the epitaxial ordering of the deposited film over a 2-3 mm2 area. (2×1) reconstructed structure patterns have also been observed which indicates that the surface of the diamond film is very smooth. The mean roughness is less than 2 nm in a 10 μm2 area as revealed by atomic force microscopy observations.

    Original languageEnglish
    Pages (from-to)333-341
    Number of pages9
    JournalNew Diamond and Frontier Carbon Technology
    Volume12
    Issue number6
    Publication statusPublished - 2002

    Fingerprint

    Diamond films
    Film growth
    Chemical vapor deposition
    Diamond
    antennas
    diamonds
    vapor deposition
    Antennas
    diamond films
    Plasmas
    Thin films
    Diamonds
    Nucleation
    Substrates
    thin films
    Electron reflection
    Microwaves
    nucleation
    microwaves
    Reflection high energy electron diffraction

    Keywords

    • Antenna edge
    • Chemical vapor deposition
    • Diamond
    • Heteroepitaxial growth
    • Iridium

    ASJC Scopus subject areas

    • Materials Science(all)
    • Surfaces, Coatings and Films
    • Surfaces and Interfaces

    Cite this

    Heteroepitaxial diamond thin film growth on Ir(001)/MgO(001) substrate by antenna-edge plasma assisted chemical vapor deposition (St. Elmo CVD). / Tachiki, Minoru; Fujisaki, Toyokatsu; Taniyama, Norikazu; Kudo, Minoru; Kawarada, Hiroshi.

    In: New Diamond and Frontier Carbon Technology, Vol. 12, No. 6, 2002, p. 333-341.

    Research output: Contribution to journalArticle

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    AU - Kudo, Minoru

    AU - Kawarada, Hiroshi

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