High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching

Takanori Katoh, Yasunori Sato, Daichi Yamaguchi, Shigetoshi Ikeda, Yasushi Aoki, Akihiro Oshima, Masakazu Washio, Yoneho Tabata

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PFTE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state 19F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.

    Original languageEnglish
    Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
    EditorsJ.A. Yasaitis, M.A. Perez-Maher, J.M. Karam
    Pages493-500
    Number of pages8
    Volume4979
    DOIs
    Publication statusPublished - 2003
    EventMicromachining and Microfarication Process Technology VIII - San Jose, CA, United States
    Duration: 2003 Jan 272003 Jan 29

    Other

    OtherMicromachining and Microfarication Process Technology VIII
    CountryUnited States
    CitySan Jose, CA
    Period03/1/2703/1/29

    Fingerprint

    Microfabrication
    Synchrotron radiation
    high aspect ratio
    Aspect ratio
    Etching
    synchrotron radiation
    etching
    polytetrafluoroethylene
    Polytetrafluoroethylenes
    crosslinking
    Crosslinking
    Irradiation
    solid state
    irradiation
    beam currents
    Crystallites
    spectroscopy
    Nuclear magnetic resonance spectroscopy
    crystallites
    Surface treatment

    Keywords

    • Crosslinking
    • Direct etching
    • High-aspect ratio
    • MEMS
    • Microfabrication
    • PTFE
    • Synchrotron radiation

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Condensed Matter Physics

    Cite this

    Katoh, T., Sato, Y., Yamaguchi, D., Ikeda, S., Aoki, Y., Oshima, A., ... Tabata, Y. (2003). High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching. In J. A. Yasaitis, M. A. Perez-Maher, & J. M. Karam (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4979, pp. 493-500) https://doi.org/10.1117/12.472802

    High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching. / Katoh, Takanori; Sato, Yasunori; Yamaguchi, Daichi; Ikeda, Shigetoshi; Aoki, Yasushi; Oshima, Akihiro; Washio, Masakazu; Tabata, Yoneho.

    Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.A. Yasaitis; M.A. Perez-Maher; J.M. Karam. Vol. 4979 2003. p. 493-500.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Katoh, T, Sato, Y, Yamaguchi, D, Ikeda, S, Aoki, Y, Oshima, A, Washio, M & Tabata, Y 2003, High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching. in JA Yasaitis, MA Perez-Maher & JM Karam (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 4979, pp. 493-500, Micromachining and Microfarication Process Technology VIII, San Jose, CA, United States, 03/1/27. https://doi.org/10.1117/12.472802
    Katoh T, Sato Y, Yamaguchi D, Ikeda S, Aoki Y, Oshima A et al. High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching. In Yasaitis JA, Perez-Maher MA, Karam JM, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4979. 2003. p. 493-500 https://doi.org/10.1117/12.472802
    Katoh, Takanori ; Sato, Yasunori ; Yamaguchi, Daichi ; Ikeda, Shigetoshi ; Aoki, Yasushi ; Oshima, Akihiro ; Washio, Masakazu ; Tabata, Yoneho. / High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching. Proceedings of SPIE - The International Society for Optical Engineering. editor / J.A. Yasaitis ; M.A. Perez-Maher ; J.M. Karam. Vol. 4979 2003. pp. 493-500
    @inproceedings{3bf09abbf80a4f258b061220b3d8acbc,
    title = "High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching",
    abstract = "High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PFTE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state 19F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.",
    keywords = "Crosslinking, Direct etching, High-aspect ratio, MEMS, Microfabrication, PTFE, Synchrotron radiation",
    author = "Takanori Katoh and Yasunori Sato and Daichi Yamaguchi and Shigetoshi Ikeda and Yasushi Aoki and Akihiro Oshima and Masakazu Washio and Yoneho Tabata",
    year = "2003",
    doi = "10.1117/12.472802",
    language = "English",
    volume = "4979",
    pages = "493--500",
    editor = "J.A. Yasaitis and M.A. Perez-Maher and J.M. Karam",
    booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

    }

    TY - GEN

    T1 - High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching

    AU - Katoh, Takanori

    AU - Sato, Yasunori

    AU - Yamaguchi, Daichi

    AU - Ikeda, Shigetoshi

    AU - Aoki, Yasushi

    AU - Oshima, Akihiro

    AU - Washio, Masakazu

    AU - Tabata, Yoneho

    PY - 2003

    Y1 - 2003

    N2 - High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PFTE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state 19F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.

    AB - High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PFTE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state 19F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.

    KW - Crosslinking

    KW - Direct etching

    KW - High-aspect ratio

    KW - MEMS

    KW - Microfabrication

    KW - PTFE

    KW - Synchrotron radiation

    UR - http://www.scopus.com/inward/record.url?scp=0042062506&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0042062506&partnerID=8YFLogxK

    U2 - 10.1117/12.472802

    DO - 10.1117/12.472802

    M3 - Conference contribution

    AN - SCOPUS:0042062506

    VL - 4979

    SP - 493

    EP - 500

    BT - Proceedings of SPIE - The International Society for Optical Engineering

    A2 - Yasaitis, J.A.

    A2 - Perez-Maher, M.A.

    A2 - Karam, J.M.

    ER -