TY - GEN
T1 - High-aspect-ratio micromachining of fluoropolymers using focused ion beam
AU - Matsui, Yoshinori
AU - Miyoshi, Nozomi
AU - Oshima, Akihiro
AU - Seki, Shu
AU - Washio, Masakazu
AU - Tagawa, Seiichi
PY - 2007/12/1
Y1 - 2007/12/1
N2 - Poly(tetrafluoroethylene) (PTFE) microstructure with high aspect ratio (> 200) and without solid debris along the edge was fabricated with high etch rate using FIB. Evolution of PTFE by FIB is responsible for the high aspect ratio, the high etch rate, and the no solid debris. Roughness of etched surface of the PTEE increases with fluence, although edge of the etched area has good profiles. The etch mechanism seems to be complicated.
AB - Poly(tetrafluoroethylene) (PTFE) microstructure with high aspect ratio (> 200) and without solid debris along the edge was fabricated with high etch rate using FIB. Evolution of PTFE by FIB is responsible for the high aspect ratio, the high etch rate, and the no solid debris. Roughness of etched surface of the PTEE increases with fluence, although edge of the etched area has good profiles. The etch mechanism seems to be complicated.
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M3 - Conference contribution
AN - SCOPUS:45749123069
SN - 9781558999800
T3 - Materials Research Society Symposium Proceedings
SP - 61
EP - 66
BT - Ion-Beam-Based Nanofabrication
T2 - Ion-Beam-Based Nanofabrication
Y2 - 10 April 2007 through 12 April 2007
ER -