High-aspect-ratio micromachining of fluoropolymers using focused ion beam

Yoshinori Matsui, Nozomi Miyoshi, Akihiro Oshima, Shu Seki, Masakazu Washio, Seiichi Tagawa

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Poly(tetrafluoroethylene) (PTFE) microstructure with high aspect ratio (> 200) and without solid debris along the edge was fabricated with high etch rate using FIB. Evolution of PTFE by FIB is responsible for the high aspect ratio, the high etch rate, and the no solid debris. Roughness of etched surface of the PTEE increases with fluence, although edge of the etched area has good profiles. The etch mechanism seems to be complicated.

    Original languageEnglish
    Title of host publicationMaterials Research Society Symposium Proceedings
    Pages61-66
    Number of pages6
    Volume1020
    Publication statusPublished - 2007
    EventIon-Beam-Based Nanofabrication - San Francisco, CA
    Duration: 2007 Apr 102007 Apr 12

    Other

    OtherIon-Beam-Based Nanofabrication
    CitySan Francisco, CA
    Period07/4/1007/4/12

    Fingerprint

    Fluorine containing polymers
    Focused ion beams
    Micromachining
    Polytetrafluoroethylenes
    Debris
    Aspect ratio
    Surface roughness
    Microstructure

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials

    Cite this

    Matsui, Y., Miyoshi, N., Oshima, A., Seki, S., Washio, M., & Tagawa, S. (2007). High-aspect-ratio micromachining of fluoropolymers using focused ion beam. In Materials Research Society Symposium Proceedings (Vol. 1020, pp. 61-66)

    High-aspect-ratio micromachining of fluoropolymers using focused ion beam. / Matsui, Yoshinori; Miyoshi, Nozomi; Oshima, Akihiro; Seki, Shu; Washio, Masakazu; Tagawa, Seiichi.

    Materials Research Society Symposium Proceedings. Vol. 1020 2007. p. 61-66.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Matsui, Y, Miyoshi, N, Oshima, A, Seki, S, Washio, M & Tagawa, S 2007, High-aspect-ratio micromachining of fluoropolymers using focused ion beam. in Materials Research Society Symposium Proceedings. vol. 1020, pp. 61-66, Ion-Beam-Based Nanofabrication, San Francisco, CA, 07/4/10.
    Matsui Y, Miyoshi N, Oshima A, Seki S, Washio M, Tagawa S. High-aspect-ratio micromachining of fluoropolymers using focused ion beam. In Materials Research Society Symposium Proceedings. Vol. 1020. 2007. p. 61-66
    Matsui, Yoshinori ; Miyoshi, Nozomi ; Oshima, Akihiro ; Seki, Shu ; Washio, Masakazu ; Tagawa, Seiichi. / High-aspect-ratio micromachining of fluoropolymers using focused ion beam. Materials Research Society Symposium Proceedings. Vol. 1020 2007. pp. 61-66
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    AU - Washio, Masakazu

    AU - Tagawa, Seiichi

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