High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO 2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO 2 hollow rubes.

Original languageEnglish
Title of host publicationProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Pages705-708
Number of pages4
Publication statusPublished - 2004
Event17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
Duration: 2004 Jan 252004 Jan 29

Other

Other17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest
CountryNetherlands
CityMaastricht
Period04/1/2504/1/29

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ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering
  • Control and Systems Engineering

Cite this

Homma, T., Sato, H., Mori, K., Osaka, T., & Shoji, S. (2004). High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process. In Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS) (pp. 705-708)