High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.

Original languageEnglish
Pages (from-to)705-708
Number of pages4
JournalProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication statusPublished - 2004 Jul 19
Event17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
Duration: 2004 Jan 252004 Jan 29

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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