High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin

Takumi Kamibayashi, Hiroyuki Kuwae, Takahiro Kishioka, Yuki Usui, Takuya Ohashi, Mamoru Tamura, Shuichi Shoji, Jun Mizuno

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We developed a fabrication method of high-aspect-ratio fine vias with a build-up resin. The build-up resin composed of a thermosetting resin and silica fillers has low coefficient of thermal expansion and low dielectric constant. Thermal imprint was performed to form the high-aspect-ratio fine via holes on the build-up resin. The imprint mold with high-aspect-ratio fine pillar patterns was fabricated by photolithography and deep reactive ion etching. The residual layer consisted of the thermosetting resin and the silica filler was removed by O 2 /CHF 3 plasma etching. The via of 1.2 μm in diameter with aspect ratio of 5.5, and 5.0 μm in pitch was successfully fabricated followed by Au electroplating. The proposed fabrication method is applicable for high-density 3-dimensional and 2.5-dimensional integration technologies.

Original languageEnglish
Title of host publication13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018
PublisherIEEE Computer Society
Pages115-118
Number of pages4
ISBN (Electronic)9781538656150
DOIs
Publication statusPublished - 2019 Jan 24
Event13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018 - Taipei, Taiwan, Province of China
Duration: 2018 Oct 242018 Oct 26

Publication series

NameProceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT
Volume2018-October
ISSN (Print)2150-5934
ISSN (Electronic)2150-5942

Conference

Conference13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018
CountryTaiwan, Province of China
CityTaipei
Period18/10/2418/10/26

Fingerprint

Aspect ratio
Resins
Thermosets
Fillers
Silica
Fabrication
Plasma etching
Reactive ion etching
Electroplating
Photolithography
Thermal expansion
Permittivity
Hot Temperature

ASJC Scopus subject areas

  • Hardware and Architecture
  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Kamibayashi, T., Kuwae, H., Kishioka, T., Usui, Y., Ohashi, T., Tamura, M., ... Mizuno, J. (2019). High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin. In 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018 (pp. 115-118). [8625825] (Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT; Vol. 2018-October). IEEE Computer Society. https://doi.org/10.1109/IMPACT.2018.8625825

High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin. / Kamibayashi, Takumi; Kuwae, Hiroyuki; Kishioka, Takahiro; Usui, Yuki; Ohashi, Takuya; Tamura, Mamoru; Shoji, Shuichi; Mizuno, Jun.

13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018. IEEE Computer Society, 2019. p. 115-118 8625825 (Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT; Vol. 2018-October).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kamibayashi, T, Kuwae, H, Kishioka, T, Usui, Y, Ohashi, T, Tamura, M, Shoji, S & Mizuno, J 2019, High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin. in 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018., 8625825, Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT, vol. 2018-October, IEEE Computer Society, pp. 115-118, 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018, Taipei, Taiwan, Province of China, 18/10/24. https://doi.org/10.1109/IMPACT.2018.8625825
Kamibayashi T, Kuwae H, Kishioka T, Usui Y, Ohashi T, Tamura M et al. High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin. In 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018. IEEE Computer Society. 2019. p. 115-118. 8625825. (Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT). https://doi.org/10.1109/IMPACT.2018.8625825
Kamibayashi, Takumi ; Kuwae, Hiroyuki ; Kishioka, Takahiro ; Usui, Yuki ; Ohashi, Takuya ; Tamura, Mamoru ; Shoji, Shuichi ; Mizuno, Jun. / High-aspect-ratio Sub-2-μm vias using thermal imprint with build-up resin. 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2018. IEEE Computer Society, 2019. pp. 115-118 (Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT).
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