High density embedded DRAM technology with 0.38 μm pitch in DRAM and 0.42 μm pitch in LOGIC by W/polySi gate and Cu dual damascene metallization

N. Takenaka*, M. Segawa, T. Uehara, S. Akamatsu, M. Matsumoto, K. Kurimoto, T. Ueda, H. Watanabe, T. Matsutani, K. Yoneda, A. Koshio, Y. Kato, M. Inuishi, T. Oashi, K. Tsukamoto

*Corresponding author for this work

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11 Citations (Scopus)

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Engineering & Materials Science