High drain current density and reduced gate leakage current in channel-doped AlGaNGaN heterostructure field-effect transistors with Al 2 O 3 Si 3 N 4 gate insulator

Narihiko Maeda, Chengxin Wang, Takatomo Enoki, Toshiki Makimoto, Takehiko Tawara

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Channel-doped AlGaNGaN heterostructure field-effect transistors (HFETs) with metal-insulator-semiconductor (MIS) structures have been fabricated to obtain the high drain current density and reduced gate leakage current. A thin bilayer dielectric of Al2 O3 (4 nm) Si3 N4 (1 nm) was used as the gate insulator, to simultaneously take advantage of the high-quality interface between Si3 N4 and AlGaN, and high resistivity and a high dielectric constant of Al2 O3. A MIS HFET with a gate length of 1.5 μm has exhibited a record high drain current density of 1.87 Amm at a gate voltage (Vg) of +3 V, which is ascribed to a high applicable Vg and a very high two-dimensional electron gas (2DEG) density of 2.6× 1013 cm-2 in the doped channel. The gate leakage current was reduced by two or three orders of magnitude, compared with that in normal HFETs without a gate insulator. The transconductance (gm) was 168 mSmm, which is high in the category of the MIS structure. Channel-doped MIS HFETs fabricated have thus been proved to exhibit the high current density, reduced gate leakage current, and relatively high transconductance, hence, promising for high-power applications.

Original languageEnglish
Article number073504
JournalApplied Physics Letters
Volume87
Issue number7
DOIs
Publication statusPublished - 2005 Aug 15
Externally publishedYes

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high current
leakage
field effect transistors
insulators
current density
MIS (semiconductors)
transconductance
gas density
electron gas
high voltages
permittivity
electrical resistivity
electric potential

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

High drain current density and reduced gate leakage current in channel-doped AlGaNGaN heterostructure field-effect transistors with Al 2 O 3 Si 3 N 4 gate insulator. / Maeda, Narihiko; Wang, Chengxin; Enoki, Takatomo; Makimoto, Toshiki; Tawara, Takehiko.

In: Applied Physics Letters, Vol. 87, No. 7, 073504, 15.08.2005.

Research output: Contribution to journalArticle

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