High-energy implantation of Hg+ ions into GaAs grown by liquid encapsulated Czochralski method: formation of multiple shallow emissions

Kentaro Harada, Bassirou Lo, Yunosuke Makita, Aboubaker C. Beye, Matthew P. Halsall, Shinji Kimura, Naoto Kobayashi, Tsutomu Iida, Takayuki Shima, Hajime Shibata, Akira Obara, Tokue Matsumori

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The incorporation of Hg atoms was carried out into liquid-encapsulated Czochralski GaAs by high-energy ion implantation. Hall effects measurements at room temperature and 2 K photoluminescence spectra revealed that rapid thermal annealing method is superior to furnace annealing method in view of electrical and optical activation. Activation rate of Hg acceptors as high as 30% was obtained. Optically activated Hg acceptor was found to produce at least six Hg-related shallow emissions in the vicinity of band edge. In addition to the conduction band to Hg acceptor transition, associated with moderately deep acceptor binding energy (52 meV) of Hg, the Hg majority acceptor is found to produce a neutral acceptor complex defect. Moreover, two relatively broad emissions, [g-g] and [g-g]α were noticeably observed which indicated apparent red- and blue-energy shift with increasing net hole concentration |NA - ND|, respectively.

Original languageEnglish
Pages (from-to)2845-2847
Number of pages3
JournalApplied Physics Letters
Volume67
Issue number19
DOIs
Publication statusPublished - 1995 Nov 6
Externally publishedYes

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Czochralski method
implantation
activation
annealing
liquids
furnaces
Hall effect
ion implantation
conduction bands
ions
binding energy
photoluminescence
energy
shift
defects
room temperature
atoms

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

High-energy implantation of Hg+ ions into GaAs grown by liquid encapsulated Czochralski method : formation of multiple shallow emissions. / Harada, Kentaro; Lo, Bassirou; Makita, Yunosuke; Beye, Aboubaker C.; Halsall, Matthew P.; Kimura, Shinji; Kobayashi, Naoto; Iida, Tsutomu; Shima, Takayuki; Shibata, Hajime; Obara, Akira; Matsumori, Tokue.

In: Applied Physics Letters, Vol. 67, No. 19, 06.11.1995, p. 2845-2847.

Research output: Contribution to journalArticle

Harada, K, Lo, B, Makita, Y, Beye, AC, Halsall, MP, Kimura, S, Kobayashi, N, Iida, T, Shima, T, Shibata, H, Obara, A & Matsumori, T 1995, 'High-energy implantation of Hg+ ions into GaAs grown by liquid encapsulated Czochralski method: formation of multiple shallow emissions', Applied Physics Letters, vol. 67, no. 19, pp. 2845-2847. https://doi.org/10.1063/1.114804
Harada, Kentaro ; Lo, Bassirou ; Makita, Yunosuke ; Beye, Aboubaker C. ; Halsall, Matthew P. ; Kimura, Shinji ; Kobayashi, Naoto ; Iida, Tsutomu ; Shima, Takayuki ; Shibata, Hajime ; Obara, Akira ; Matsumori, Tokue. / High-energy implantation of Hg+ ions into GaAs grown by liquid encapsulated Czochralski method : formation of multiple shallow emissions. In: Applied Physics Letters. 1995 ; Vol. 67, No. 19. pp. 2845-2847.
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